Optical Member Plasma Shaping for Wavelength-Selective Transmittance
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Solution Overview
Problem
Existing methods for forming uneven shapes on optical members and light-emitting devices are limited in achieving desired optical properties, particularly in creating height differences through partial removal by etching, which affects light transmittance across various wavelengths.
Innovation Solution
A manufacturing method involving plasma irradiation of an optical member intermediate with a surface containing recessed portions, using atmospheres with oxygen radicals, CF4, or SF6, to deepen recessed portions and increase the height of central regions, resulting in enhanced light transmittance at shorter wavelengths and reduced transmittance at longer wavelengths.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional etching methods are used to form uneven shapes on optical members, then manufacturing simplicity is maintained, but the ability to achieve desired optical properties and create specific height differences is limited
Solution Approach 1:
The patent changes the fundamental parameter of the etching process from conventional chemical etching to plasma etching using specific gases (CF4, CHF3, SF6). This parameter change enables precise control over etching depth and height difference formation, achieving the desired optical properties while maintaining manufacturing feasibility through controlled plasma conditions
Solution Approach 2:
The patent applies preliminary plasma treatment to the optical member surface before final shaping. This preliminary action prepares the surface by creating initial unevenness and enhancing etchability, allowing subsequent etching steps to achieve the target height differences more precisely and efficiently
2Productivity
If uneven shapes are formed on optical member surface, then light diffusion efficiency is improved, but manufacturing complexity increases
Solution Approach 1:
The patent employs self-service by utilizing the plasma etching process itself to automatically create the desired uneven surface structure. The plasma naturally conforms to the underlying pattern and self-organizes into the required height differences and protrusions, eliminating the need for additional mechanical or chemical processing steps to create the uneven geometry
Solution Approach 2:
The patent replaces complex mechanical shaping or multi-step chemical etching systems with a plasma-based system. This substitution simplifies the manufacturing apparatus while achieving superior light diffusion efficiency through precisely controlled plasma etching that creates the necessary surface unevenness in a single integrated process
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method enhances light transmittance at shorter wavelengths and reduces it at longer wavelengths, improving optical properties by creating a shape that is difficult to achieve through conventional etching methods, leading to more efficient light diffusion and reduced color or luminance unevenness in light-emitting devices.
Implementation Method 1
irradiating the upper surface of the optical member intermediate with plasma under an atmosphere containing at least one selected from the group consisting of an oxygen radical, CF4, CHF3, and SF6
Data Source
AI summary
A manufacturing method of an optical member includes: preparing an optical member intermediate having light transmissivity, the optical member intermediate including an upper surface including a peripheral portion and recessed portions recessed from the peripheral portion, the peripheral portion including first regions and second regions, each of the first regions being defined by a circle surrounded by three or more of the recessed portions and passing through a point on an outer edge of each of the three or more of the recess portions in a top view; and irradiating the upper surface of the optical member intermediate with plasma under an atmosphere containing at least one selected from the group consisting of an oxygen radical, CF4, CHF3, and SF6 to make a height of a center of each of the first regions to be higher than a height of each of the second regions.