Optical Spectrometer Gas Dissociation Measurement

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Solution Overview

Problem

Current methods for detecting and controlling gas dissociation degrees in gas processing, such as adjusting gas flow rates or using physical or chemical methods, are ineffective, leading to inefficient and costly cleaning processes in semiconductor manufacturing, where manual cleaning and repeated testing are necessary due to the lack of precise control over reactive gas dissociation.

Innovation Solution

A method and device using an optical spectrometer to measure gas dissociation degrees, allowing for the calculation of a relative dissociation quantity value, which enables the discharge of an appropriate amount of dissociated reactive gas to effectively remove contaminants in the main chamber, reducing labor and material costs by automating the cleaning process.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If physical or chemical methods are used to detect and control gas dissociation degrees, then gas flow rates and gas proportioning can be adjusted, but the cleaning process remains inefficient and costly due to lack of precise control

Engineering Contradiction:
Improvegas dissociation degree detection precisionVSAvoidcleaning process efficiency
Core Design Contradiction:
Measurement precisionVSProductivity

Solution Approach 1:

The patent replaces physical or chemical detection methods with an optical detection system. Specifically, it uses optical absorption spectroscopy where light passes through the gas and the absorption spectrum is analyzed to determine dissociation degree. This substitution enables precise, real-time measurement of gas dissociation degrees, directly resolving the measurement precision issue while providing feedback for efficient cleaning control.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent implements a feedback mechanism where the optical detection system continuously monitors gas dissociation degrees and this information is used to control the cleaning process. The system adjusts gas flow rates and dissociation parameters based on real-time measurements, creating a closed-loop control system that improves both measurement precision and cleaning efficiency simultaneously.

Inventive Principle:
Principle #23Feedback

2Reliability

If manual cleaning and repeated testing are performed, then cleaning can be accomplished, but labor and material costs increase significantly

Engineering Contradiction:
Improvecleaning effectivenessVSAvoidcleaning process time
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

The patent enables the cleaning system to monitor and control its own process automatically. The optical detection system provides real-time feedback on gas dissociation degrees, allowing the system to self-adjust parameters and determine when cleaning is complete without manual intervention. This self-service capability eliminates repeated testing and reduces both time and labor costs while maintaining reliable cleaning effectiveness.

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

The patent replaces manual cleaning operations and subjective testing with an automated optical detection and control system. The objective optical measurements provide reliable determination of cleaning status, eliminating the need for repeated manual testing and reducing both time loss and labor costs while maintaining or improving cleaning effectiveness.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Object-affected harmful factors

If reactive gas is discharged without precise control of dissociation degree, then contaminants can be removed, but gas waste and operating costs increase

Engineering Contradiction:
Improvecontaminant removal effectivenessVSAvoidreactive gas consumption
Core Design Contradiction:
Object-affected harmful factorsVSLoss of substance

Solution Approach 1:

The patent uses optical detection to provide real-time feedback on gas dissociation degrees during the cleaning process. This feedback enables precise control of reactive gas discharge, allowing the system to maintain optimal dissociation levels for effective contaminant removal while minimizing excess gas consumption. The closed-loop control ensures reactive gas is used only when and where needed.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The patent implements precise control of gas dissociation parameters through optical monitoring. By measuring absorption spectra and determining dissociation degrees in real-time, the system can adjust gas flow rates and power parameters to maintain optimal dissociation levels. This parameter control ensures effective contaminant removal while minimizing reactive gas waste and reducing operating costs.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution enables efficient and effective cleaning of semiconductor manufacturing chambers by automatically determining the necessary amount of reactive gas for dissociation, reducing the need for manual cleaning and repeated testing, thereby lowering labor and material costs while improving cleaning efficiency.

Implementation Method 1

a detecting element and an optical spectrum plasma gas dissociation measuring device are disposed between the main chamber and the second chamber; the detecting element detects the plasma gas dissociation degree in the tube body

Methodology Applied
Scientific EffectAbsorption spectroscopy: Absorption Spectroscopy

Data Source

PatentUS10204840B2Method for measuring gas dissociation degrees
Publication Date: 2019.02.12 FAIRTECH CORPORATION
  • US10204840B2 patent drawing
  • US10204840B2 patent drawing
  • US10204840B2 patent drawing

AI summary

A method for measuring gas dissociation degrees is provided. The method comprises the following steps. A reaction process with at least one reactive gas in a main path and a second path connecting to the main path is performed. A plasma gas dissociation degree of the reactive gas in the reaction process is detected. A dissociation quantity value of the reactive gas in the reaction process is calculated. An amount of the reactive gas in the main path after the reaction process is provided. The reactive gas is discharged according to the dissociation quantity value of the reactive gas for removing contaminants in the main path.