Organic Microlens Protective Layer for Controlled Pad Etching

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Solution Overview

Problem

There is a growing need to protect the array of organic microlenses in an efficient manner, as existing methods struggle to ensure uniform coating and mechanical protection during the manufacturing process.

Innovation Solution

The implementation of a protective layer with a first region deposited on the array of organic microlenses and a second region on the transparent organic layer, which acts as a hard mask during etch processes and provides mechanical protection during manufacturing steps such as dicing and polishing.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Strength

If a protective layer is deposited on the array of organic microlenses, then mechanical protection is provided during manufacturing steps, but the coating uniformity and etching process control become more challenging

Engineering Contradiction:
Improvemechanical protectionVSAvoidcoating uniformity
Core Design Contradiction:
StrengthVSManufacturing precision

Solution Approach 1:

The protective layer is divided into two distinct regions: a first region deposited on the array of organic microlenses and a second region deposited on the transparent organic layer. This segmentation allows each region to be optimized independently - the first region provides mechanical protection to the microlenses while the second region serves as a controlled etch stop layer, resolving the contradiction between providing protection and maintaining manufacturing precision.

Inventive Principle:
Principle #1Segmentation

2Strength

If a protective layer is deposited on the array of organic microlenses, then mechanical protection is provided during dicing and polishing, but the etching process complexity increases

Engineering Contradiction:
Improvemechanical protectionVSAvoidetching process complexity
Core Design Contradiction:
StrengthVSDevice complexity

Solution Approach 1:

The second region of the protective layer acts as an intermediary etch stop layer between the first region (on microlenses) and the transparent organic layer. This intermediary structure simplifies the overall etching process by providing a defined stopping point, preventing over-etching, and enabling selective removal of materials without requiring complex process control.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The protective layer effectively shields the organic microlenses from damage, ensures uniform coating, and facilitates efficient etching processes, thereby enhancing the manufacturing yield and quality of the optical units.

Implementation Method 1

a protective layer which includes a first protective layer region deposited on the array of organic microlenses and a second protective layer region deposited on a part of an upper layer of the transparent organic layer

Methodology Applied
Scientific EffectPhysical Vapour Deposition: Physical Vapour Deposition

Data Source

PatentUS12266670B2Method for manufacturing an optical unit that comprises an array of organic microlenses
Publication Date: 2025.04.01 TOWER SEMICONDUCTOR LTD
  • US12266670B2 patent drawing
  • US12266670B2 patent drawing
  • US12266670B2 patent drawing

AI summary

A method for manufacturing optical unit, the method includes (a) obtaining an intermediate optical unit that comprises a semiconductor portion, a transparent organic layer, the array of organic microlenses and a protective layer; (b) depositing a protective mask above a first protective layer region; (c) removing, by applying a first etch process, the second protective layer region to expose a second region of the transparent organic layer; and (d) removing, by applying a second etch process, the second region of the transparent organic layer to expose the contact pads and removing the protective mask while maintaining the first protective layer portion.