Organic TFT Array Substrate Four-Step Patterning Method

The patent combines multiple patterning operations into integrated process steps. Specifically, the source electrode, drain electrode, and data line are formed simultaneously in one patterning process, and the gate electrode and gate line are formed simultaneously in another patterning process. This merging of operations reduces the total number of separate patterning steps and masks required, thereby simplifying the manufacturing process while maintaining component formation quality.

The patent employs multi-functional mask designs where single masks serve multiple purposes. For example, masks are designed to pattern both electrodes and conductive lines simultaneously, and to form multiple components in a single application. This multi-functionality reduces the total mask count and process steps while achieving the required manufacturing precision for all transistor components.

The patent merges multiple component formation operations into fewer simultaneous patterning steps. By designing patterns that form source electrodes, drain electrodes, and data lines in one step, and gate electrodes and gate lines in another step, the total process time is reduced compared to sequential formation of each component. This increases productivity while maintaining the precision needed for functional transistor operation.

The patent incorporates preliminary design considerations into the mask patterns themselves, where the mask geometry is pre-configured to create multiple functional components simultaneously. This preliminary planning allows subsequent processing steps to form complete transistor structures in fewer operations, reducing overall manufacturing time and improving productivity without sacrificing component quality.

The patent combines multiple patterning functions into fewer mask designs. By creating masks that pattern multiple components simultaneously (such as source electrode and data line in one mask, gate electrode and gate line in another mask), the total number of masks required is reduced. This decreases mask fabrication costs and process complexity while maintaining the precision needed for functional transistor operation.

The patent designs multi-functional masks where each mask serves multiple purposes in the fabrication process. A single mask is designed to create multiple electrode and conductive line patterns that are all required for transistor operation. This universality reduces the total mask count, lowering material costs and simplifying the manufacturing process while achieving the required pattern accuracy for all components.