High Resolution Organic Thin Film Pattern Formation
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Solution Overview
Problem
Existing methods for manufacturing high-resolution organic thin film patterns, such as those for OLEDs and organic thin film transistors, face challenges due to the limitations of vacuum deposition and shadow mask resolution, as well as chemical compatibility issues with solvents used in photolithography, leading to complex and costly processes.
Innovation Solution
A method involving the use of a fluorine-based polymer as the first organic layer, selectively removed using laser ablation, followed by the deposition of a second organic layer with organic light emitting or semiconductor materials, utilizing a fluorine-based solvent to lift off the pattern without damaging the organic layers, allowing for high-resolution pattern formation with simplified and cost-effective processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If vacuum deposition method with shadow mask is used, then organic thin film can be deposited, but manufacturing resolution is limited and process complexity increases
Solution Approach 1:
The patent replaces the mechanical shadow mask system with a photomask and photolithography system. Instead of using physical shadow masks in vacuum deposition, the invention uses light-based photolithography to define patterns, achieving higher resolution without the mechanical limitations of shadow masks.
Solution Approach 2:
The patent changes the deposition method from vacuum deposition to solution processing. By dissolving organic materials in solvents and applying them through spin coating or similar techniques, the process achieves better pattern definition and higher resolution while simplifying the manufacturing steps.
2Manufacturing precision
If photolithography with conventional solvents is used, then pattern definition is improved, but organic materials are damaged due to chemical incompatibility
Solution Approach 1:
The patent changes the chemical parameters by selecting solvents that are compatible with organic materials. Instead of using conventional photolithography solvents that damage organic compounds, the invention uses organic-compatible solvents that allow pattern definition without degrading the material.
Solution Approach 2:
The patent introduces a sacrificial layer as an intermediary element. This layer is selectively removed to define patterns, allowing the organic functional layers to be deposited without direct exposure to harsh chemicals, thus protecting material integrity while achieving good pattern definition.
3Reliability
If multiple process steps are used to ensure compatibility, then material protection is improved, but manufacturing cost and process time increase
Solution Approach 1:
The patent merges the pattern definition and material deposition steps into a unified solution processing approach. By using compatible solvents from the beginning, the need for separate protective steps is eliminated, reducing process time and increasing manufacturing efficiency while maintaining material protection.
Solution Approach 2:
The patent performs preliminary selection of compatible solvents and appropriate deposition methods before processing. By choosing the right solvent-material combinations upfront, the process avoids the need for multiple corrective or protective steps during manufacturing, improving productivity while ensuring material protection.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables the formation of high-resolution organic thin film patterns without deteriorating the organic materials, simplifying the manufacturing process, and achieving low-cost, stable, and high-resolution organic electronic devices, such as OLEDs and OTFTs, with improved chemical compatibility and reduced need for additional chemical development steps.
Implementation Method 1
a laser ablation method may be used to irradiate a laser on a mask having a predetermined pattern disposed on the first organic layer
Data Source
Figure 1A~1C
Figure 1D~2B
Figure 2C~2D
AI summary
A method of forming a high resolution organic thin film pattern, the method including forming a first organic layer (130) on a substrate (110); selectively removing the first organic layer by selectively irradiating light energy onto the first organic layer (130), and forming a remaining part of the first organic layer as a sacrifice layer (131); forming a second organic layer (150) on the substrate (110) and the entire surface of the sacrifice layer (131); and lifting off the second organic layer formed on the sacrifice layer (131) by removing the sacrifice layer using a solvent, and forming the remaining second organic layer as a second organic layer pattern (153).