Organotin Oxide Hydroxide Coatings via In Situ Hydrolysis for EUV Patterning
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Solution Overview
Problem
Existing organotin oxide hydroxide patterning technologies face constraints in solubility, stability, and solvolysis processes, limiting the range of accessible ligand identities and stoichiometries, which affect the performance of radiation patternable coatings, particularly for EUV and electron-beam resists.
Innovation Solution
The use of in situ hydrolysis of precursor compositions, comprising RnSnX(4-n) compounds, allows for the formation of organotin oxide hydroxide coatings with a broader range of ligand identities and stoichiometries, enabling improved patterning performance through vapor deposition methods, reducing radiation doses, and achieving low line width roughness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If conventional organotin oxide hydroxide patterning technologies are used, then the patterning process can be performed, but solubility and stability constraints limit the range of accessible ligand identities and stoichiometries
Solution Approach 1:
The patent applies preliminary action by performing in situ hydrolysis of precursor compositions (RnSnX(4-n) compounds) before the actual patterning process. This hydrolysis step converts the precursors into organotin oxide hydroxide coatings with desired ligand identities and stoichiometries, enabling broader compositional flexibility while maintaining process reliability. The hydrolysis reaction RnSnX(4-n) + (4-n)H2O → RnSnO(2-(n/2))(OH)n + (4-n)HX occurs in situ during coating formation, allowing precise control over the final coating composition.
Solution Approach 2:
The patent employs parameter changes by systematically varying the precursor composition parameters (n values from 0 to 4, different R groups, different X ligands) to achieve a broader range of ligand identities and stoichiometries in the final coating. By changing the precursor formulation parameters and controlling the hydrolysis conditions, the patent expands the accessible compositional space while maintaining solubility and stability through the use of appropriate organic solvents and controlled hydrolysis rates.
2Manufacturing precision
If higher radiation doses are used for patterning, then the patterning can be achieved, but line width roughness increases
Solution Approach 1:
The patent applies parameter changes by optimizing the coating composition parameters (ligand identity, stoichiometry, organic component content) to achieve lower radiation dose requirements. The specific composition parameters are tuned to enhance radiation sensitivity and improve pattern fidelity, allowing high-resolution patterning at reduced doses. This reduces line width roughness while maintaining manufacturing precision.
Solution Approach 2:
The patent uses composite materials by combining organotin oxide hydroxide with specific organic ligands and solvents to create a composite coating system that exhibits enhanced radiation sensitivity and reduced line width roughness. The composite nature of the coating (inorganic organotin oxide hydroxide framework with organic ligands) allows for optimized radiation response and improved pattern quality at lower doses.
3Productivity
If a broader range of ligand compositions is used, then patterning performance improves, but solubility constraints are exceeded
Solution Approach 1:
The patent employs an intermediary approach by using organic solvents and ligands as mediators between the inorganic organotin oxide hydroxide framework and the desired broader ligand compositions. These intermediaries enable the incorporation of diverse ligand identities while maintaining solubility during the coating process. The organic components act as bridges that allow access to a broader compositional space without exceeding solubility limits.
Solution Approach 2:
The patent applies parameter changes by systematically adjusting the solvent composition, ligand-to-metal ratio, and hydrolysis conditions to accommodate a broader range of ligand compositions. By changing these process parameters, the patent maintains solubility while enabling access to diverse ligand identities that improve patterning performance.
4Adaptability or versatility
If in situ hydrolysis is performed, then a broader range of ligand identities and stoichiometries are accessible, but the process complexity increases
Solution Approach 1:
The patent applies merging by combining the coating deposition and hydrolysis steps into a single integrated in situ process. Rather than separately coating the precursor and then performing hydrolysis, the patent merges these operations so that hydrolysis occurs during the coating formation itself. This reduces the number of discrete process steps while maintaining access to a broader range of ligand identities and stoichiometries.
Solution Approach 2:
The patent employs self-service by designing the precursor composition to undergo automatic hydrolysis under the coating conditions without requiring external intervention. The hydrolysis reaction proceeds self-initiated during the coating process, converting the precursor RnSnX(4-n) to the desired organotin oxide hydroxide coating. This self-service approach simplifies the overall process while enabling broader compositional flexibility.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method enables high-resolution patterning with reduced radiation doses and improved line width roughness, overcoming solubility and stability constraints, and allowing for a wider range of ligand compositions in organotin oxide hydroxide coatings.
Implementation Method 1
In a first aspect, the invention pertains to a coating solution comprising an organic solvent, a first organometallic composition, and a metal compound with hydrolysable ligand-metal bonds
Implementation Method 2
enabling improved patterning performance through vapor deposition methods
Data Source
AI summary
Organometallic precursors are described for the formation of high resolution lithography patterning coatings based on metal oxide hydroxide chemistry. The precursor compositions generally comprise ligands readily hydrolysable by water vapor or other OH source composition under modest conditions. The organometallic precursors generally comprise a radiation sensitive organo ligand to tin that can result in a coating that can be effective for high resolution patterning at relatively low radiation doses and is particularly useful for EUV patterning. The precursors compositions are readily processable under commercially suitable conditions. Solution phase processing with in situ hydrolysis or vapor based deposition can be used to form the coatings.