Oxide TFT Display Layout for Low Parasitic Capacitance

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Solution Overview

Problem

Display devices face challenges in minimizing parasitic capacitance in pixel transistors, which affects image quality, and in enhancing carrier mobility in driving circuit transistors to improve output characteristics.

Innovation Solution

The design includes transistors with different structures in display and non-display areas, where pixel transistors have a gate insulating layer covering the active layer to reduce parasitic capacitance, and driving circuit transistors have an etched gate insulating layer to increase carrier mobility, both using oxide semiconductors for efficient manufacturing.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Object-affected harmful factors

If the gate insulating layer covers the entire active layer in pixel transistors, then parasitic capacitance is reduced, but carrier mobility is decreased

Engineering Contradiction:
Improveparasitic capacitanceVSAvoidcarrier mobility
Core Design Contradiction:
Object-affected harmful factorsVSReliability

Solution Approach 1:

The patent applies different gate insulating layer configurations to different transistor types: pixel transistors have a gate insulating layer covering the entire active layer to minimize parasitic capacitance and improve image quality, while driving circuit transistors have an etched gate insulating layer to maximize carrier mobility and output characteristics. This local differentiation resolves the contradiction by optimizing each transistor type for its specific functional requirements.

Inventive Principle:
Principle #3Local quality

2Reliability

If the gate insulating layer is etched to expose source and drain regions, then carrier mobility is increased, but parasitic capacitance increases

Engineering Contradiction:
Improvecarrier mobilityVSAvoidparasitic capacitance
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The patent implements location-specific gate insulating layer structures: driving circuit transistors in the non-display area have etched gate insulating layers to enhance carrier mobility for high-performance signal processing, while pixel transistors in the display area maintain covered gate insulating layers to minimize parasitic capacitance for high-quality image display. This spatial differentiation resolves the contradiction between mobility enhancement and capacitance control.

Inventive Principle:
Principle #3Local quality

3Reliability

If different transistor structures are used in display and non-display areas, then performance is optimized, but manufacturing complexity increases

Engineering Contradiction:
Improvetransistor performanceVSAvoidmanufacturing process
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent divides the substrate into display area and non-display area, and further segments the transistor population into pixel transistors and driving circuit transistors. Each segment receives a customized gate insulating layer configuration appropriate to its functional requirements. This segmentation approach enables performance optimization for each transistor type while maintaining a manageable manufacturing process through systematic differentiation.

Inventive Principle:
Principle #1Segmentation

Data Source

PatentEP4468357A1Display device and method for manufacturing the same
Publication Date: 2024.11.27 SAMSUNG DISPLAY CO LTD
  • EP4468357A1 patent drawingFigure 1
  • EP4468357A1 patent drawingFigure 2
  • EP4468357A1 patent drawingFigure 3

AI summary

A display device includes a pixel including a first transistor, and a driving circuit including a second transistor. The first transistor includes a first active layer including first source and drain regions apart from each other with a first channel region therebetween, a first gate insulating layer on the first active layer and covering the first channel, source and drain regions, and a first gate electrode on the first gate insulating layer and overlapping the first channel region. The second transistor includes a second active layer including second source and drain regions apart from each other with a second channel region therebetween, a second gate insulating layer on a part of the second active layer including the second channel region and exposing the second source and drain regions, and a second gate electrode disposed on the second gate insulating layer and overlapping the second channel region.