Oxidized Double-Layer Electrodes for LCD Aperture Ratio

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Solution Overview

Problem

Existing liquid crystal display (LCD) devices with a double-layered structure for in-plane switching (IPS) mode suffer from granular residues of the second conductive material, which reduce response speed, brightness, and cause defects in the alignment layer, leading to limited viewing angles and reflectance issues.

Innovation Solution

A method of manufacturing an array substrate for LCD devices involving the formation of gate and data lines, thin film transistors, and double-layered conductive electrodes using different materials, where the first conductive material is oxidized and the second conductive material is deposited on top, followed by a photoresist pattern etching process to create narrow pixel and common electrodes, reducing residue formation and enhancing aperture ratio and ambient contrast.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Illumination intensity

If a double-layered structure using different conductive materials is used for pixel and common electrodes, then aperture ratio is improved and reflectance for ambient light is reduced, but granular residues remain causing reduced response speed, reduced brightness, and alignment layer defects

Engineering Contradiction:
ImprovebrightnessVSAvoidresponse speed
Core Design Contradiction:
Illumination intensityVSReliability

Solution Approach 1:

The patent changes the surface state parameter of the first conductive material layer by oxidizing it before depositing the second conductive material layer. This parameter change prevents the second layer from growing along the crystallization direction of the first layer, thereby eliminating granular residues while maintaining the double-layered structure's benefits for aperture ratio and reflectance reduction.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The oxidation treatment is performed as a preliminary action before depositing the second conductive material layer. This preliminary modification of the first layer's surface prevents the formation of granular residues during subsequent deposition, ensuring better etching performance and eliminating the need for additional residue removal steps.

Inventive Principle:
Principle #10Preliminary action

2Illumination intensity

If a double-layered structure using different conductive materials is used for pixel and common electrodes, then aperture ratio is improved and reflectance for ambient light is reduced, but granular residues cause defects in rubbing alignment layer

Engineering Contradiction:
ImprovebrightnessVSAvoidalignment layer integrity
Core Design Contradiction:
Illumination intensityVSManufacturing precision

Solution Approach 1:

The patent changes the surface state parameter of the first conductive material layer by oxidizing it before depositing the second conductive material layer. This parameter change prevents the second layer from growing along the crystallization direction of the first layer, thereby eliminating granular residues while maintaining the double-layered structure's benefits for aperture ratio and reflectance reduction.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The oxidation treatment is performed as a preliminary action before depositing the second conductive material layer. This preliminary modification of the first layer's surface prevents the formation of granular residues during subsequent deposition, ensuring better etching performance and eliminating the need for additional residue removal steps.

Inventive Principle:
Principle #10Preliminary action

3Area of stationary object

If narrow pixel and common electrodes with width of about 2.2 μm or less are used, then aperture ratio is improved, but granular residues affect electric field and reduce liquid crystal response speed

Engineering Contradiction:
Improveaperture ratioVSAvoidliquid crystal response speed
Core Design Contradiction:
Area of stationary objectVSReliability

Solution Approach 1:

The patent changes the surface state parameter of the first conductive material layer by oxidizing it before depositing the second conductive material layer. This parameter change prevents the second layer from growing along the crystallization direction of the first layer, thereby eliminating granular residues while maintaining the double-layered structure's benefits for aperture ratio and reflectance reduction.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The oxidation treatment is performed as a preliminary action before depositing the second conductive material layer. This preliminary modification of the first layer's surface prevents the formation of granular residues during subsequent deposition, ensuring better etching performance and eliminating the need for additional residue removal steps.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The approach improves aperture ratio, reduces reflectance for ambient light, and enhances production efficiency by preventing granular residue formation, thus improving the LCD's response speed, brightness, and alignment layer integrity.

Implementation Method 1

oxidizing a surface of the first conductive material layer

Methodology Applied
Scientific EffectOxidation: Oxidation

Implementation Method 2

etching the first and second conductive material layers using the photoresist pattern

Methodology Applied
Scientific EffectEtching:

Data Source

PatentUS8647902B2Method of manufacturing array substrate for liquid crystal display device
Publication Date: 2014.02.11 LG DISPLAY CO LTD
  • US8647902B2 patent drawing
  • US8647902B2 patent drawing
  • US8647902B2 patent drawing

AI summary

A method of manufacturing an array substrate for a liquid crystal display device includes forming gate and data lines crossing each other on a substrate; forming a thin film transistor connected to the gate and data lines; forming a passivation layer on the substrate having the gate lines, data lines and the thin film transistor; forming a first conductive material layer on the passivation layer and connected to a drain electrode of the thin film transistor; oxidizing a surface of the first conductive material layer; forming a second conductive material layer on the oxidized first conductive material layer; forming a photoresist pattern on the second conductive material layer; etching the first and second conductive material layers using the photoresist pattern to form pixel and common electrodes which are alternately arranged in the pixel region and produces an in-plane electric field; and removing the photoresist pattern.