Particle Beam Deflection Unit for Multi-Beam Optical Axis Alignment
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Solution Overview
Problem
Existing particle beam devices lack the capability to efficiently select and deflect multiple particle beams with different charged particles, limiting their imaging, analyzing, and processing capabilities.
Innovation Solution
A particle beam device is designed with a first and second particle beam generator for generating beams with electrons or ions, featuring a deflection unit that allows for the selection and deflection of these beams along a shared optical axis, enabling stigmatic imaging.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If multiple particle beam generators are used to generate different types of particle beams, then the imaging and processing capabilities are improved, but the device complexity increases
Solution Approach 1:
The patent implements a universal particle beam device that can handle multiple types of charged particles (electrons, ions, molecular ions) through a single integrated system. The beam selector unit can choose between different particle beam generators (electron beam generator, ion beam generator, molecular ion beam generator) and direct them through a common optical path to the object, allowing the same device to perform various imaging and processing functions without requiring separate dedicated systems for each particle type.
2Adaptability or versatility
If a beam selector and deflection unit are added to manage multiple particle beams, then the versatility of the device is improved, but the device complexity increases
Solution Approach 1:
The patent introduces a beam selector unit as an intermediary component between the multiple particle beam generators and the optical path. This selector unit acts as a gatekeeper that can selectively transmit or block different particle beams based on the desired operation. Additionally, a deflection unit serves as another intermediary to redirect ion beams and molecular ion beams onto the optical path when needed, while allowing electron beams to pass through directly, thus managing multiple beam types through controlled intermediary components.
3Adaptability or versatility
If ion beams are deflected onto the optical path, then the processing capability is improved, but the beam quality and focusing may deteriorate
Solution Approach 1:
The patent employs dynamic control of the deflection unit to redirect ion beams onto the optical path only when processing operations are required. The deflection can be adjusted in real-time based on the operational mode, allowing the system to switch between transmitting ion beams through deflection and maintaining direct electron beam paths. This dynamic adjustment helps preserve beam quality by minimizing unnecessary deflections while enabling processing capabilities when needed.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The device achieves efficient selection and deflection of particle beams, allowing for high-quality imaging and processing of objects, while maintaining beam quality and focusing capabilities.
Implementation Method 1
a deflection unit for deflecting charged particles of the second particle beam from the second generator beam axis to the optical axis
Implementation Method 2
an objective lens for focusing charged particles of the first particle beam or of the second particle beam onto the object
Data Source
AI summary
The invention relates to a particle beam device (100) for imaging, analyzing and/or processing an object (114). The particle beam device (100) comprises a first particle beam generator (300) for generating a first particle beam, wherein the first particle beam generator (300) has a first generator beam axis (301), wherein an optical axis (OA) of the particle beam device (100) and the first generator beam axis (301) are identical; a second particle beam generator (400) for generating a second particle beam, wherein the second particle beam generator (400) has a second generator beam axis (401), wherein the optical axis (OA) and the second generator beam axis (401) are arranged at an angle being different from 0° and 180°; a deflection unit (500) for deflecting the second particle beam from the second generator beam axis (401) to the optical axis (OA) and along the optical axis (OA), wherein the deflection unit (500) has a first opening (501) and a second opening (502) being different from the first opening (501), wherein the optical axis (OA) runs through the first opening (501), wherein the second generator beam axis (401) runs through the second opening (502); an objective lens (107) for focusing the first particle beam or the second particle beam onto the object (114), wherein the optical axis (OA) runs through the objective lens (107); and at least one detector (116, 121, 122) for detecting interaction particles and/or interaction radiation.