Multi-charged Particle Beam Deflection for Coulomb Effect Reduction

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Solution Overview

Problem

Multi-beam inspection and irradiation apparatuses face challenges in achieving high resolution and high throughput due to the Coulomb effect, which causes beam blurring as the total current of multiple beams increases, necessitating a reduction in the Coulomb effect to maintain beam convergence and accuracy.

Innovation Solution

A multi-charged particle beam irradiation apparatus and inspection apparatus that utilize a forming mechanism to create multiple charged particle beams, a multipole deflector array to individually deflect each beam, and an electron optical system to maintain a state where the beams do not converge, thereby reducing the Coulomb effect and preventing beam blurring.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the total current of multiple beams is increased to achieve high throughput, then productivity is improved, but the Coulomb effect increases causing beam blurring and reducing manufacturing precision

Engineering Contradiction:
ImprovethroughputVSAvoidbeam diameter
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The patent segments the multiple charged particle beams spatially by preventing their convergence in the same plane. The multipole deflector array individually deflects each beam so that their center axis trajectories do not converge in a region of a same plane orthogonal to the direction of a central axis, thereby reducing the Coulomb effect while maintaining high total current for high throughput inspection

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent resolves the contradiction by transitioning from a two-dimensional convergence problem to a three-dimensional solution. By ensuring beams do not converge in the same plane (adding the plane dimension as a constraint), the Coulomb effect is reduced while allowing high total current to be maintained for high productivity

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Manufacturing precision

If the beam diameter is reduced to achieve high resolution, then manufacturing precision is improved, but the total current must be reduced thereby lowering productivity

Engineering Contradiction:
Improvebeam diameterVSAvoidthroughput
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The patent segments the beam paths in space by using the multipole deflector array to individually deflect each beam's trajectory. This spatial segmentation allows each beam to maintain a small diameter for high resolution while the system maintains high total current through multiple beams, achieving both high precision and high throughput

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent changes the spatial arrangement parameter of the beams by preventing convergence in the same plane. This parameter change allows the system to maintain small beam diameters for high resolution while increasing the total current across multiple beams to achieve high productivity

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach allows for increased total current of multiple beams without increasing beam diameter, enabling high-resolution and high-throughput irradiation and inspection while maintaining beam accuracy and reducing aberration.

Implementation Method 1

with the increase in the total amount of current of multiple beams, the Coulomb effect also increases, resulting in blurring of the beams

Methodology Applied
Scientific EffectCoulomb effect: Coulomb's Law

Implementation Method 2

a multipole deflector array configured to individually deflect each beam of the multiple charged particle beams

Methodology Applied
Scientific EffectElectromagnetic deflection: Lorentz Force

Data Source

PatentUS11417495B2Multi-charged particle beam irradiation apparatus and multi-charged particle beam inspection apparatus
Publication Date: 2022.08.16 NUFLARE TECH INC
  • US11417495B2 patent drawing
  • US11417495B2 patent drawing
  • US11417495B2 patent drawing

AI summary

A multi-charged particle beam irradiation apparatus includes a forming mechanism to form multiple charged particle beams, a multipole deflector array to individually deflect each beam of the multiple charged particle beams so that a center axis trajectory of each beam of the multiple charged particle beams may not converge in a region of the same plane orthogonal to the direction of a central axis of a trajectory of the multiple charged particle beams, and an electron optical system to irradiate a substrate with the multiple charged particle beams while maintaining a state where the multiple charged particle beams are not converged.