Scanning Particle Microscope Reference Object Positioning
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Solution Overview
Problem
Current optical measuring processes in nanotechnology, such as those using ArF lasers, have limited resolution, and scanning particle microscopes face challenges in maintaining a constant particle beam position due to internal and external disturbances, leading to inaccuracies in measuring and processing nanoscale structures on photolithographic masks.
Innovation Solution
An apparatus and method utilizing a scanning particle microscope with a first reference object and a distance measuring device to determine the absolute position of elements on a photolithographic mask by establishing a relative position relative to the reference object and measuring the distance between reference objects, thereby eliminating column-internal and external error sources, allowing for precise conversion of positions and reducing the need for complex reference marks.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If scanning particle microscopes are used to achieve high spatial resolution in nanoscale measurements, then measurement precision is improved, but beam position stability deteriorates due to internal and external disturbances
Solution Approach 1:
The patent implements feedback by continuously monitoring the beam position using reference objects and automatically compensating for deviations through beam position correction mechanisms. The system measures the actual beam position relative to reference objects and adjusts the beam accordingly to maintain stability and accuracy in nanoscale measurements
Solution Approach 2:
The patent introduces reference objects as intermediaries between the beam and the sample. These reference objects serve as stable reference points that enable indirect measurement and correction of beam position, allowing the system to compensate for disturbances without directly affecting the beam-sample interaction
2Measurement precision
If reference marks are deposited on photolithographic masks to correct beam position, then measurement accuracy is improved, but device complexity and processing time increase
Solution Approach 1:
The patent uses reference objects that are imaged or sensed by the particle beam to create measurement data, rather than requiring physical reference marks to be deposited on the mask. This copying approach allows position determination through sensing existing features, eliminating the need for complex deposition and removal processes
Solution Approach 2:
The patent extracts the reference function from the mask structure itself by using separate reference objects that can be sensed independently. This separation allows the measurement system to determine beam position and correct distortions without requiring additional processing steps to add or remove reference marks from the photolithographic mask
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the precision of determining the position of elements on photolithographic masks by stabilizing the particle beam position, improving spatial resolution, and avoiding the complications of depositing and removing reference marks, thus improving the accuracy and reliability of nanoscale measurements and processing.
Implementation Method 1
In scanning particle microscopes, a particle beam interacts with a sample. Scanning particle microscopes are abbreviated SBM (Scanning Particle Beam Microscope) below. By way of example, electrons and/or ions are used as particles.
Implementation Method 2
at least one distance measuring device (270), which is embodied to determine a distance between the first reference object and a second reference object
Data Source
AI summary
The present application relates to an apparatus for determining a position of at least one element on a photolithographic mask, said apparatus comprising: (a) at least one scanning particle microscope comprising a first reference object, wherein the first reference object is disposed on the scanning particle microscope in such a way that the scanning particle microscope can be used to determine a relative position of the at least one element on the photolithographic mask relative to the first reference object; and (b) at least one distance measuring device, which is embodied to determine a distance between the first reference object and a second reference object, wherein there is a relationship between the second reference object and the photolithographic mask.