Patch Antenna Dielectric Layout for Low-Elevation Gain

The patent applies local quality by providing a second dielectric member with a higher relative dielectric constant specifically around the first dielectric member, rather than uniformly increasing dielectric constants throughout the entire antenna structure. This localized enhancement of dielectric properties improves low elevation angle gain without requiring a proportional increase in overall antenna volume, thus resolving the contradiction between size reduction and performance maintenance.

The patent changes the dielectric parameter (relative dielectric constant) of the second dielectric member to be higher than that of the first dielectric member. This parameter change allows the antenna to achieve improved low elevation angle gain performance within a compact volume, as the higher dielectric constant concentrates and enhances the electromagnetic field in the critical radiation region without requiring increased physical dimensions.

The patent applies local quality by concentrating the dielectric enhancement in the form of a second dielectric member positioned around the first dielectric member, rather than expanding the ground base area uniformly. This localized dielectric structure improves radiation performance at low elevation angles without requiring a proportional increase in ground base area, thus resolving the contradiction between footprint reduction and radiation performance.

The patent uses a composite dielectric structure consisting of two different dielectric members with different relative dielectric constants. The first dielectric member supports the radiating element, while the second dielectric member with higher dielectric constant is positioned around it to enhance field concentration and radiation performance. This composite approach allows improved radiation performance within a compact ground base area.