Region-Based Pattern Data Formatting for E-Beam Writing

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Solution Overview

Problem

Conventional pattern data formats in electron beam writing apparatuses have many unused bits, leading to increased data size and reduced throughput due to the need to accommodate all possible sizes, coordinates, and figure types, which becomes inefficient with the trend of pattern miniaturization and increased pattern numbers.

Innovation Solution

A writing apparatus and method that selects and uses different bit formats for each predetermined region based on pattern information, converting data to reduce the number of bits used, thereby optimizing data size and throughput.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If conventional pattern data format with fixed number of bits is used, then all possible pattern sizes, coordinates, figure types, and number of figures can be accommodated, but the number of unused bits accumulates resulting in large data size

Engineering Contradiction:
Improvepattern data format adaptabilityVSAvoiddata size
Core Design Contradiction:
Adaptability or versatilityVSQuantity of substance

Solution Approach 1:

The patent divides the writing region into multiple predetermined regions and selects different data formats for each region based on pattern characteristics. This segmentation allows each region to use the most appropriate format, reducing overall data size while maintaining adaptability for different pattern types.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent introduces dynamic format selection where the data format is not fixed but changes based on the specific pattern information in each region. The system dynamically determines the optimal format (different bit allocations) for each region, transforming the static conventional approach into a dynamic adaptive system.

Inventive Principle:
Principle #15Dynamics

2Loss of information

If conventional pattern data format is used, then comprehensive pattern information can be stored, but throughput of the apparatus decreases due to large data size

Engineering Contradiction:
Improvepattern information completenessVSAvoidapparatus throughput
Core Design Contradiction:
Loss of informationVSProductivity

Solution Approach 1:

The patent applies local quality by using different data formats in different regions based on their specific pattern characteristics. Each region receives a tailored format that provides exactly the information needed for that region's patterns, avoiding the waste of storing unnecessary information in all regions.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent changes the data format parameters (number of bits allocated for different fields) based on the actual pattern information present in each region. By adjusting these parameters dynamically, the system maintains complete pattern information while minimizing data size to improve throughput.

Inventive Principle:
Principle #35Parameter changes

3Device complexity

If fixed data format is used for all regions, then implementation is simple, but writing time increases due to processing unnecessary data

Engineering Contradiction:
Improvedata format processing complexityVSAvoidwriting time
Core Design Contradiction:
Device complexityVSLoss of time

Solution Approach 1:

The patent performs preliminary analysis of pattern information in each region before writing, selecting the appropriate format in advance. This preliminary action allows the system to optimize data representation before the actual writing process, reducing writing time without significantly increasing overall complexity.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Significantly reduces the number of unused bits in writing data, resulting in smaller data size and increased throughput by adaptively selecting formats based on pattern characteristics, such as figure number, type, and size, specifically reducing data size by up to 38% in certain layouts.

Implementation Method 1

the electron beam intrinsically having excellent resolution is used for producing such highly precise master patterns

Methodology Applied
Scientific EffectElectron beam: Electron Beam

Data Source

PatentUS20090145751A1Writing apparatus and writing data conversion method
Publication Date: 2009.06.11 NUFLARE TECH INC
  • US20090145751A1 patent drawing
  • US20090145751A1 patent drawing
  • US20090145751A1 patent drawing

AI summary

A writing apparatus includes a storage unit configured to store writing data, an acquiring unit configured to acquire information on a pattern defined based on the writing data, a selecting unit configured to select a format of a plurality of formats having different number of bits to be used, based on acquired information on the pattern, for each predetermined region, a converting unit configured to convert data in the predetermined region defined by the writing data, by using a selected format, and a writing unit configured to write a predetermined pattern on a target workpiece, based on converted data in the predetermined region.