Pattern Forming Method Using Light-Shielding Layer for Fine Patterning
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Solution Overview
Problem
Current pattern forming methods using printing techniques face challenges in achieving high accuracy and fine patterns due to difficulties in combining short-wavelength ultraviolet light exposure with projection optical systems, leading to increased costs and reduced sensitivity, as well as issues with pattern alignment and sharpness on deformable substrates.
Innovation Solution
A method involving a substrate with a first layer and a second layer of different refractive indices, where light is irradiated to create regions with varying contact angles, allowing for the formation of patterns by controlling the wettability and spreading of ink, utilizing attenuation and reflection properties to enhance pattern accuracy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If short-wavelength ultraviolet light exposure is used to form fine patterns, then pattern fineness is improved, but device cost increases and sensitivity decreases
Solution Approach 1:
The patent introduces a light-shielding layer as an intermediary component between the substrate and the photosensitive layer. This layer reflects exposure light back onto the photosensitive layer, enabling the use of longer-wavelength, lower-cost light sources while achieving fine pattern formation. The light-shielding layer acts as a mediator that recycles and redirects light energy, allowing cost-effective equipment to achieve precision previously requiring expensive short-wavelength sources.
2Productivity
If contact light exposure method is used, then processing time is reduced, but pattern alignment accuracy deteriorates on deformable substrates
Solution Approach 1:
The patent transitions from direct contact exposure to projection exposure, adding an optical dimension to the process. By using a projection optical system, the mask pattern is projected onto the substrate through light, allowing non-contact processing. This dimensional change enables processing of deformable substrates without physical contact, maintaining alignment accuracy while preserving productivity benefits.
3Productivity
If ozone processing is combined with light irradiation, then processing speed is improved, but pattern sharpness deteriorates due to diffusion
Solution Approach 1:
The patent extracts and separates the light exposure function from the ozone processing function. By using a light-shielding layer to control pattern formation through optical reflection, the method eliminates the need for ozone diffusion to create sharp interfaces. The light-shielding layer defines pattern boundaries optically before any chemical processing occurs, preventing diffusion-related blurring while maintaining fast processing speeds.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach improves pattern accuracy and reduces costs by enabling the formation of fine patterns on deformable substrates with increased sensitivity and alignment precision, while maintaining the benefits of reduced processing time and lower material costs.
Implementation Method 1
a first layer provided on the first face and having a first refractive index, wherein scattered and other light is suppressed by the first layer
Implementation Method 2
a second layer provided on the first layer and having a second refractive index different from the first refractive index, wherein a portion of the light which has passed through the photosensitive lyophilic/lyophobic original material is reflected at an interface between the second layer and the first layer and is incident on the photosensitive lyophilic/lyophobic original material again
Implementation Method 3
performing a first process of irradiating light onto one of a first portion at a first position of the photosensitive hydrophilic/hydrophobic original material and a second portion at a second position of the photosensitive hydrophilic/hydrophobic original material
Data Source
AI summary
According to one embodiment, a pattern forming method is disclosed. The method includes preparing a processed body including a substrate having a first face, a first layer provided on the first face, a second layer provided on the first layer, and a photosensitive lyophilic/lyophobic original material provided on the second layer. The method includes performing a first process of irradiating light onto one of a first portion at a first position of the material and a second portion at a second position of the material, and making a first contact angle of a liquid with a first region of an upper face of the processed body relatively larger than a second contact angle of the liquid with a second region of the upper face. The method includes performing a first pattern forming process of forming a first pattern by bringing the liquid into contact with the second region.