Charged Beam Photolithography Pattern Writing Circuit Self-Diagnosis
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Solution Overview
Problem
Current charged beam photolithography apparatuses lack effective means to maintain normality, leading to continuous production of abnormal masks due to undetected pattern writing errors caused by processing abnormalities in the pattern writing circuit, resulting in significant damage.
Innovation Solution
A pattern writing circuit self-diagnosis method that inputs layout information and pattern writing conditions, collects processing result data, and compares it with correct data to diagnose and maintain the normality of the charged beam photolithography apparatus.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If continuous pattern writing operation is performed without self-diagnosis, then productivity is improved, but reliability deteriorates due to undetected circuit abnormalities
Solution Approach 1:
The pattern writing circuit performs self-diagnosis by automatically comparing its own processing results with correct data, enabling the system to self-monitor and self-diagnose without external intervention, thus maintaining reliability during continuous operation
Solution Approach 2:
The system implements feedback by comparing processing result data from the pattern writing circuit with correct data, detecting abnormalities when mismatches occur, and enabling corrective actions to maintain system reliability
2Reliability
If self-diagnosis function is added to the charged beam photolithography apparatus, then reliability is improved through abnormality detection, but device complexity increases
Solution Approach 1:
The self-diagnosis function is merged with the existing pattern writing circuit by utilizing the same processing result data output from the circuit, rather than adding completely separate diagnosis hardware, thus minimizing the increase in device complexity
Solution Approach 2:
The pattern writing circuit serves dual purposes: it performs the primary function of generating shot data for pattern writing and simultaneously provides data for self-diagnosis, making the circuit multi-functional and reducing the need for additional dedicated diagnosis components
Data Source
AI summary
A pattern writing circuit self-diagnosis method for a charged beam photolithography apparatus and a charged beam photolithography apparatus which enable to maintain normality of the charged beam photolithography apparatus are provided. The pattern writing circuit self-diagnosis method for a charged beam photolithography apparatus is a pattern writing circuit self-diagnosis method for a charged beam photolithography apparatus which irradiates a charged beam on a target sample to write a desired pattern. Layout information and a pattern writing conditions which is prepared in advance are input to the pattern writing circuit, and processing result data of the pattern writing circuit output as a result of the inputting is collected. The collected processing result data of the pattern writing circuit is compared with correct data. The charged beam photolithography apparatus has means which realizes the pattern writing circuit self-diagnosis method.