Permanganate CMP Slurry for Selective Hardmask Polishing
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Solution Overview
Problem
Conventional slurries fail to effectively polish hardmasks with non-carbon boron, silicon, chromium, or zirconium components, lacking sufficient selectivity, removal rate, and tunability in chemical mechanical planarization processes.
Innovation Solution
A composition comprising a permanganate ion of a permanganate oxidizer, used in conjunction with a chemical mechanical planarization apparatus, to remove at least a portion of the hardmask, which includes non-carbon boron, silicon, chromium, or zirconium components, offering improved selectivity, removal rate, and tunability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If conventional slurries are used for polishing hardmasks, then the polishing process can be performed, but the selectivity and removal rate are insufficient
Solution Approach 1:
The patent changes the chemical composition parameters of the slurry by incorporating permanganate ions and specific chelating agents, which fundamentally alters the chemical interaction mechanisms with the hardmask materials, thereby achieving both high removal rates and excellent selectivity simultaneously
Solution Approach 2:
The patent uses composite slurry formulations containing multiple components including permanganate oxidizers, chelating agents, and abrasive particles that work synergistically to achieve superior polishing performance on diverse hardmask materials with high selectivity and removal rate
2Adaptability or versatility
If conventional slurries are used for polishing hardmasks, then the polishing process can be performed, but the tunability is limited
Solution Approach 1:
The patent enables dynamic adjustment of slurry properties by varying the concentrations of permanganate ions, chelating agents, and abrasives, allowing the same base formulation to be tuned for different hardmask compositions and polishing conditions, thereby achieving high versatility without requiring completely different slurry systems
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The permanganate-based composition enhances the polishing performance by providing superior selectivity and control over the removal process, including operational pH range and polishing pad type, effectively addressing the limitations of conventional slurries.
Implementation Method 1
a composition comprising a permanganate ion of a permanganate oxidizer
Data Source
AI summary
A system for polishing a hardmask comprises a composition comprising a permanganate ion of a permanganate oxidizer; a substrate comprising a hardmask that comprises at least one of a non-carbon boron component, a boron-carbon component, a non-carbon silicon component, a non-carbon chromium component, a non-carbon zirconium component, or any combination thereof; and a chemical mechanical planarization (CMP) apparatus configured to bring the composition and the substrate into contact so as to remove at least a portion of the hardmask of the substrate.