Photocurable Composition with High Quantum Yield Photobase Generator
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Solution Overview
Problem
Current photocurable compositions with photobase generators have low quantum yields and struggle to achieve high adhesion and cohesion, especially when cured with limited light exposure, due to low molecular weight curable compounds and insufficient crosslinking.
Innovation Solution
A photocurable composition comprising a salt of a carboxylic acid and a basic compound, combined with a curable compound having multiple functional groups such as epoxy, (meth)acryloyl, isocyanato, acid anhydride, or alkoxysilyl groups, which are activated by the generated base to enhance curing and adhesion.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a photobase generator with low quantum yield is used, then the composition can be cured with conventional light sources, but the adhesion and cohesion of the cured product are insufficient
Solution Approach 1:
The patent changes the chemical structure parameters of the photobase generator by introducing specific substituents (electron-withdrawing groups like nitro, cyano, or carbonyl groups at positions 2 and 6 of the pyridine ring) to optimize the quantum yield of base generation while maintaining reliable adhesion and cohesion of the cured product
Solution Approach 2:
The patent creates a composite photobase generator system by combining a pyridine derivative with specific substituents and a carboxylic acid component, where the synergistic interaction between these components achieves both high quantum yield and sufficient adhesion/cohesion of the cured product
2Reliability
If the light exposure time is extended to improve curing, then adhesion improves, but productivity decreases
Solution Approach 1:
The patent optimizes the molecular weight parameter of the curable compound within the range of 500-5000 to achieve rapid curing with sufficient adhesion, reducing the required light exposure time while maintaining product quality
Solution Approach 2:
The patent enables the curing process to complete rapidly by using a photobase generator with high base generation quantum yield and a curable compound with optimized molecular weight, allowing the adhesion to develop sufficiently in a short light exposure time without requiring extended curing
3Ease of operation
If a curable compound with low molecular weight is used, then the composition viscosity is low and coating is easy, but the cohesion of the cured product is insufficient
Solution Approach 1:
The patent optimizes the molecular weight of the curable compound to fall within the specific range of 500-5000, which balances the composition viscosity for easy coating application with sufficient cohesion of the cured product after curing
4Reliability
If the curable compound molecular weight is increased to improve cohesion, then adhesion and cohesion improve, but the composition viscosity increases making coating difficult
Solution Approach 1:
The patent establishes an optimal molecular weight range (500-5000) for the curable compound that simultaneously achieves good adhesion and cohesion of the cured product while maintaining composition viscosity at a level suitable for easy coating application
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves high quantum yield base generation and rapid curing, resulting in improved adhesion and cohesion of the cured product, even with limited light exposure, by optimizing the molecular weight and crosslinking density of the curable compound.
Implementation Method 1
a photobase generator (A) which is a salt of a carboxylic acid (a1-1) represented by formula (1-1) with a basic compound (a2)... a compound generating a base upon irradiation with light
Implementation Method 2
a curable compound (B) which has, in one molecule thereof, at least two functional groups selected from among epoxy group, (meth)acryloyl group, isocyanato group, acid anhydride group, and alkoxysilyl group... the composition is cured into a cured product
Data Source
AI summary
The present invention provides a photocurable composition which contains a photobase generator capable of generating a satisfactory amount of a base in a high quantum yield when irradiated even with a small quantity of light for a short time, and contains a curable compound that is rapidly cured by the generated base such that the composition is cured into a cured product. The photocurable composition comprises: a photobase generator (A) which is a salt of a carboxylic acid (a1-1) represented by the following formula (1-1) with a basic compound (a2), and a curable compound (B) which has, in one molecule thereof, at least two functional groups selected from among epoxy group, (meth)acryloyl group, isocyanato group, acid anhydride group, and alkoxysilyl group,where R1 to R7 in the above formula (1-1) each are hydrogen or an organic group, R1 to R7 may be the same or different, and two of R1 to R7 may be bonded to each other to form a ring structure.