Photosensitive Materials TRIZ Cases
- Radiation-Sensitive Printing Plate Composition for Neutral pH Development
A radiation-sensitive printing plate composition uses photopolymerization to form images with neutral pH developers.
- Negative Photosensitive Material for HDD Suspension Boards
A negative photosensitive material uses a specific polyimide precursor and pyridine derivative to form precise patterns on suspension boards.
- Resist Composition with Dual Resin Units for DOF and Defect Control
A resist composition uses two specific resin units to enable acid-triggered solubility changes during pattern development.
- Fluorinated Polymer Resist Composition for ArF Lithography
A fluorinated polymer with specific recurring units forms a chemically amplified resist composition transparent to 193 nm light.