Positive Resist Composition Norbornane Lactone Resolution
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Solution Overview
Problem
Current positive resist compositions for semiconductor manufacturing face challenges in achieving excellent in-plane uniformity of line width and light width roughness (LWR) while minimizing development defects, particularly when using excimer laser lithography, due to poor solubility in solvents and limitations in imaging performance.
Innovation Solution
A positive resist composition comprising a resin with specific repeating units that increase solubility in alkaline developers, combined with a compound generating acid upon actinic ray or radiation treatment, which includes alicyclic hydrocarbon structures and a methacrylic acid repeating unit, to enhance pattern formation and resolution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If norbornane lactone is used in resist composition, then sensitivity and resolution are improved, but solubility in solvent deteriorates causing development defects
Solution Approach 1:
The patent modifies the chemical structure of norbornane lactone by introducing specific substituent groups (R1-R6 with defined chemical groups) to alter solubility parameters while preserving the sensitivity and resolution benefits. This structural parameter change resolves the contradiction between improved resolution and development defects.
Solution Approach 2:
The patent creates a composite resist composition containing the modified norbornane lactone compound (Formula 1) combined with specific resins and solvents that enhance solubility. This composite approach maintains the high resolution benefits of norbornane lactone while compensating for solubility issues through synergistic material combinations.
2Ease of manufacture
If conventional resist composition is used, then coating property is maintained, but in-plane uniformity of line width and LWR performance deteriorate
Solution Approach 1:
The patent introduces specific functional groups and structural modifications at localized positions within the norbornane lactone molecule (specific R1-R6 substitutions) to enhance line width uniformity and LWR performance without affecting overall coating properties. This localized structural optimization resolves the contradiction between ease of manufacture and manufacturing precision.
3Quantity of substance
If excimer laser lithography is used, then sensitivity is improved, but light width roughness and development defects increase
Solution Approach 1:
The patent uses the modified norbornane lactone compound as an intermediary between the excimer laser radiation and the resin matrix, mediating the energy transfer to achieve high sensitivity while the specific molecular structure (Formula 1 with defined substituents) controls the morphological outcomes to reduce light width roughness and development defects.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed composition improves in-plane uniformity of line width, reduces development defects, and achieves excellent LWR performance, effectively addressing the limitations of existing resist compositions by enhancing solubility and imaging performance.
Implementation Method 1
a compound that generates an acid upon treatment with one of an actinic ray and radiation
Data Source
AI summary
A positive resist composition comprising: a resin that comprises a repeating unit including a specific norbornane lactone structure and a repeating unit including a specific alicyclic hydrocarbon structure, and that increases a solubility of the resin in an alkaline developer by an action of an acid; and a compound that generates an acid upon treatment with one of an actinic ray and radiation, and a pattern forming method utilizing the same.