Resist Composition with Dual Resin Units for DOF and Defect Control
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Solution Overview
Problem
Conventional resist compositions often fail to achieve satisfactory focus margin (DOF) and result in an increased number of defects in the resist pattern produced.
Innovation Solution
A resist composition comprising a resin with specific structural units represented by formulas (I) and (II), an acid generator, and a solvent, where the resin becomes soluble in alkali aqueous solution upon acid action, is applied to a substrate, dried, exposed, heated, and developed to form a resist pattern.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist composition is used, then the resist pattern can be produced, but the focus margin (DOF) is not satisfied and the number of defects increases
Solution Approach 1:
The patent changes the chemical composition parameters of the resist by incorporating specific structural units (I) and (II) with defined molecular weights and ratios. This composition optimization resolves the contradiction by achieving both satisfactory focus margin and reduced defects through precise control of resin structure and acid generator content
Solution Approach 2:
The patent uses a composite resist system combining multiple resin components (structural units I and II) with an acid generator. This composite approach allows the resist to achieve both good focus margin and low defect rates by synergistic interaction between the carboxyl-containing resin and the acid-labile group-containing resin
2Ease of manufacture
If the resin becomes soluble in alkali aqueous solution by acid action, then the development process is improved, but the dry etching resistance may be compromised
Solution Approach 1:
The patent applies local quality by having different structural units provide different functions: structural unit (I) with carboxyl groups provides solubility for development, while structural unit (II) with acid-labile groups provides dry etching resistance. The specific ratio (0.1-10 mol%) optimizes this local differentiation to resolve the contradiction
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition improves the focus margin and reduces defects in the resist pattern, enhancing the production of high-quality resist patterns with improved resolution and dry etching resistance.
Implementation Method 1
an acid generator... becoming soluble in an alkali aqueous solution by the action of an acid
Implementation Method 2
heating the exposed composition layer
Data Source
AI summary
A resist composition having; (A1) a resin having a structural unit represented by the formula (I), (A2) a resin having a structural unit represented by the formula (II) and being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I) and (B) an acid generator.wherein R1, A1, A13, X12, A14, R3 and ring X1 are defined in the specification.