Photosensitive Composition for Low-CTE High-Tg Package Patterns

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Solution Overview

Problem

Existing photosensitive compositions used in forming patterns for semiconductor packages exhibit high coefficients of thermal expansion (CTE) and low glass transition temperatures (Tg), which are undesirable for reliable performance in display devices with touch panels.

Innovation Solution

A photosensitive composition comprising a compound A with a carboxy group, a compound β that reduces the carboxy group content upon exposure, and a filler, specifically designed to form patterns with low CTE and high Tg, is developed. The composition includes compounds like acridine and silicon dioxide, with optimized mass ratios and particle sizes to enhance pattern formability and stability.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If conventional photosensitive composition is used, then pattern formation is achieved, but the pattern exhibits high CTE and low Tg

Engineering Contradiction:
Improvepattern stabilityVSAvoidglass transition temperature
Core Design Contradiction:
ReliabilityVSTemperature

Solution Approach 1:

The patent changes the chemical composition parameters of the photosensitive material by incorporating specific resins (polyester, acrylic, vinyl) with defined functional groups and ratios, along with catalysts and solvents in optimized concentrations, to achieve patterns with high Tg and low CTE that meet reliability requirements for display devices

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent creates a composite photosensitive composition combining multiple resin types (polyester resin, acrylic resin, vinyl resin) with catalysts, solvents, and other additives in specific ratios, forming a multi-component system that achieves both low CTE and high Tg properties in the cured pattern

Inventive Principle:
Principle #40Composite materials

2Reliability

If conventional photosensitive composition is used, then pattern formation is achieved, but the pattern exhibits high CTE

Engineering Contradiction:
Improvepattern stabilityVSAvoidcoefficient of thermal expansion
Core Design Contradiction:
ReliabilityVSDifficulty of detecting and measuring

Solution Approach 1:

The patent modifies the thermal expansion characteristics by adjusting the chemical composition parameters, specifically using resins with low thermal expansion coefficients and optimizing the ratio of polyester, acrylic, and vinyl resins to achieve patterns with CTE of 30 ppm/K or less at match with glass substrates

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The composition effectively reduces the CTE and increases the Tg of formed patterns, leading to improved reliability and performance in semiconductor packages and display devices with touch panels.

Implementation Method 1

a compound β having a structure in which an amount of the carboxy group included in the compound A is decreased by exposure

Methodology Applied
Scientific EffectPhotoexcitation: Photoelectric Effect

Implementation Method 2

the compound β is a compound B having a structure capable of accepting an electron from the carboxy group included in the compound A in a photoexcited state

Methodology Applied
Scientific EffectElectron transfer: Redox Reactions

Data Source

PatentUS20240395551A1Photosensitive composition, transfer film, cured film, semiconductor package, pattern forming method, and manufacturing method of semiconductor package
Publication Date: 2024.11.28 FUJIFILM CORP
  • US20240395551A1 patent drawing
  • US20240395551A1 patent drawing
  • US20240395551A1 patent drawing

AI summary

An object of the present invention is to provide a photosensitive composition capable of forming a pattern having a low coefficient of thermal expansion and a high glass transition temperature; a transfer film; a cured film; a semiconductor package; a pattern forming method; and a manufacturing method of a semiconductor package. The photosensitive composition of the present invention contains a compound A having a carboxy group, a compound β having a structure in which an amount of the carboxy group included in the compound A is decreased by exposure, and a filler.