Photosensitive Resin Composition for Color Filter
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Solution Overview
Problem
Color filters used in liquid crystal display devices require both chemical and heat resistance to withstand diverse liquid chemicals and heat treatments during manufacturing, but existing photosensitive resins often fall short in providing adequate resistance, leading to yield and pattern stability issues.
Innovation Solution
A photosensitive resin composition comprising a dye-polymer composite with specific repeating units, a binder resin, a photopolymerizable monomer, a photopolymerization initiator, and a solvent, which provides improved heat and chemical resistance through controlled cross-linking and polymerization reactions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional photosensitive resins are used to maintain pattern formation, then development margin is achieved, but chemical resistance deteriorates leading to yield issues
Solution Approach 1:
The patent uses a composite resin composition combining a colorless polymer matrix with a photosensitive dye. The polymer provides chemical resistance while the dye provides photosensitivity and color. This composite structure resolves the contradiction by integrating materials with complementary properties - the polymer backbone resists chemical degradation during manufacturing while the embedded dye molecules enable optical functionality.
Solution Approach 2:
The patent modifies the chemical structure of the photosensitive resin by introducing specific functional groups and molecular weight ranges. By controlling parameters such as molecular weight (100-500,000 g/mol) and incorporating specific monomers, the resin achieves both adequate chemical resistance and photosensitive properties, preventing pattern distortion during chemical treatments while maintaining yield.
2Reliability
If conventional photosensitive resins are used for pattern formation, then development margin is maintained, but heat resistance deteriorates causing pattern distortion
Solution Approach 1:
The patent employs a composite system where a thermally stable polymer matrix is combined with a photosensitive dye. The polymer component provides heat resistance during manufacturing processes while the dye provides the necessary optical properties. This composite approach allows the resin to withstand heat treatments without causing pattern distortion or losing photosensitive functionality.
Solution Approach 2:
The patent specifies particular parameter ranges including molecular weight (100-500,000 g/mol) and incorporates specific monomers with controlled thermal stability. By adjusting these parameters, the resin achieves adequate heat resistance to maintain pattern stability during manufacturing while preserving photosensitive characteristics for precise patterning.
3Reliability
If high chemical resistance is achieved through resin composition, then pattern stability improves, but photosensitivity deteriorates
Solution Approach 1:
The patent uses a composite resin composition where a colorless polymer matrix is combined with a photosensitive dye. The polymer provides chemical resistance and structural stability, while the dye provides photosensitivity and color. This composite structure allows simultaneous achievement of high chemical resistance and adequate photosensitivity for pattern formation.
Solution Approach 2:
The patent applies local quality by having different components serve different functions within the same material system. The polymer matrix provides uniform chemical resistance throughout, while the photosensitive dye is distributed to provide localized optical response. This functional differentiation allows the material to be both chemically resistant and photosensitive where needed.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition enhances the chemical and heat resistance of color filters, resulting in high contrast ratios and luminescence characteristics, with minimal pattern distortion and improved developability.
Implementation Method 1
a photopolymerizable monomer; and a photopolymerization initiator
Data Source
AI summary
Disclosed is a photosensitive resin composition for a color filter including (A) a dye-polymer composite wherein the dye includes a repeating unit derived from a compound represented by the following Chemical Formula 1, wherein in Chemical Formula 1, each substituent is the same as defined in the detailed description; (B) a binder resin; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent.