Pillared Electrodes in Multi-Beam Deflector Arrays
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Solution Overview
Problem
Existing multi-beam deflector arrays in particle-beam exposure apparatuses face issues with stray fields causing cross-talk between apertures, leading to reduced precision and efficiency in beam control.
Innovation Solution
The electrodes in the multi-beam deflector array are designed to be pillared and bonded to the main body, with protrusions and an isolating coating to shield neighboring apertures from stray fields, using materials like indium for bonding and silicon for electrodes, and a support plate for additional stability and shielding.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If electrodes are integrated into the deflector array plate, then beam deflection control is achieved, but stray fields cause cross-talk between apertures reducing precision
Solution Approach 1:
The deflector array is segmented into separate functional plates: an aperture plate with through-holes and a deflector plate with electrodes. This segmentation isolates the electrodes from the aperture structures, allowing independent optimization of each component and reducing electromagnetic interference between adjacent apertures and electrodes.
Solution Approach 2:
A dielectric layer is introduced as an intermediary between the electrodes and the aperture plate. This dielectric barrier confines the electric fields generated by the electrodes, preventing stray fields from extending into regions where they would cause cross-talk between adjacent beamlets, thus improving beam control precision.
2Adaptability or versatility
If multiple plates are stacked to form PD device, then beam pattern definition capability is improved, but device complexity increases
Solution Approach 1:
The aperture plate and deflector plate are merged into a single integrated PD device assembly with defined spacing. The aperture plate defines beam patterns through its hole structure while the deflector plate provides electrostatic control, combining both functions in one unified device rather than requiring separate components.
Solution Approach 2:
The aperture plate serves multiple functions: it defines the beam pattern geometry, provides mechanical support for the deflector plate, and acts as an electrostatic shield. The deflector plate simultaneously controls multiple beamlets independently through its array of electrodes, achieving versatile beam patterning capability.
3Power
If electrodes protrude from plate surface, then beam deflection effectiveness is improved, but cross-talk between neighboring apertures increases
Solution Approach 1:
The electrodes are designed with non-uniform geometry: they protrude locally at positions corresponding to aperture centers where beam deflection is needed, while recessing or being shielded in regions between apertures. This local quality variation concentrates electric fields where useful for beam control while minimizing stray fields that would cause cross-talk.
Solution Approach 2:
A dielectric layer is positioned between the protruding electrodes and the aperture plate to mediate the electric field interaction. This intermediary confines the electric fields to localized regions around each electrode-aperture pair, preventing field lines from extending to neighboring apertures and causing cross-talk.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively reduces cross-talk between apertures, enhancing the precision and efficiency of beam control by shielding stray fields and maintaining a stable electrical connection, thus improving the overall performance of the particle-beam exposure apparatus.
Implementation Method 1
the electrodes being connected to one side of the main body of the multi-beam deflector array means by means of bonding connections
Implementation Method 2
The solution according to the invention allows shielding of neighboring apertures from stray fields and, thus, reducing cross-talk between the apertures
Data Source
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AI summary
The invention relates to a multi-beam deflector array means (203) for use in a particle-beam exposure apparatus employing a beam of charged particles, said multi-beam deflector array means having an overall plate-like shape with a membrane region and a buried CMOS-layer, said membrane region comprising a first side (FS) facing towards the incoming beam of particles and a second side (SS) opposite to the first side, an array of apertures, each aperture (230) allowing passage of a corresponding beam element formed out of said beam of particles, and an array of electrodes (222,223), each aperture (230) being associated with at least one of said electrodes and the electrodes being controlled via said CMOS layer, wherein the electrodes are pillared, standing proud of the main body of the multi-beam deflector array means, the electrodes being connected to one side of the main body of the multi-beam deflector array means by means of bonding connections.