Pixel Electrode and Metal Film Patterning With One Resist Mask
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Solution Overview
Problem
Conventional active matrix display devices require multiple resist masks for forming pixel electrodes and stacked wiring, leading to increased manufacturing complexity and costs due to the need for separate masks for each layer, particularly in areas with level differences, which can result in disconnection and manufacturing defects.
Innovation Solution
A method where a pixel electrode and a metal film are formed using a single resist mask, with the metal film covering level differences and having a smaller surface area than the pixel electrode, preventing disconnection and allowing the metal film to serve as a light-shielding layer, thereby reducing manufacturing steps and costs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple resist masks are used for forming pixel electrodes and stacked wiring, then each layer can be formed with precise patterning, but the manufacturing process becomes complex and costly
Solution Approach 1:
The patent combines the formation of pixel electrodes and stacked wiring into a single resist mask process. The resist mask is formed with a specific pattern that allows both the pixel electrode and the stacked wiring to be defined simultaneously, eliminating the need for multiple separate resist mask steps and reducing manufacturing complexity while maintaining patterning precision
Solution Approach 2:
The single resist mask serves multiple functions: it defines the pixel electrode pattern, defines the stacked wiring pattern, and establishes the spatial relationship between these structures. This multi-functional approach replaces what would traditionally require multiple specialized resist masks for different layers
2Adaptability or versatility
If separate resist masks are used for pixel electrode and metal film formation, then each structure can be optimized independently, but the number of manufacturing steps increases
Solution Approach 1:
The patent merges the patterning steps for pixel electrodes and metal films into a single resist mask formation and etching process. The resist mask is designed with patterns that simultaneously define both structures, allowing them to be formed in one sequence rather than requiring separate mask and etch steps for each
3Illumination intensity
If transparent conductive film is used with high resistance, then transparency is maintained, but additional metal film is required to cover the resistance
Solution Approach 1:
The patent employs a composite structure combining transparent conductive film and metal film. The transparent conductive film provides the necessary transparency for display applications, while the metal film layer compensates for the high resistance of the transparent conductive material, achieving both optical and electrical performance requirements
Data Source
AI summary
It is an object of the present invention to form a pixel electrode and a metal film using one resist mask in manufacturing a stacked structure by forming the metal film over the pixel electrode. A conductive film to be a pixel electrode and a metal film are stacked. A resist pattern having a thick region and a region thinner than the thick region is formed over the metal film using an exposure mask having a semi light-transmitting portion. The pixel electrode, and the metal film formed over part of the pixel electrode to be in contact therewith are formed using the resist pattern. Accordingly, a pixel electrode and a metal film can be formed using one resist mask.