Planar Optical Waveguide Using Photoresist Refractive Index Contrast
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Solution Overview
Problem
Current optical communication systems face challenges in reducing the size and cost of optical waveguides, which are typically large and expensive due to their design and manufacturing methods.
Innovation Solution
The development of an optical communication transmitting device with a waveguide unit formed from a photo-resist layer exposed by a high energy light source, featuring a refractive index structure that enables total internal reflection, reducing the size and cost by using a substrate, a first layer with a lower refractive index, and a second layer with a higher refractive index than the waveguide unit.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If optical waveguides are made using traditional optical fiber methods, then the optical transmission performance is maintained, but the size and cost of the device increase
Solution Approach 1:
The patent replaces traditional mechanical optical fiber waveguides with a planar integrated waveguide structure formed on a substrate. The waveguide is created by forming a high-refractive-index layer (n2) on a substrate (n1) where n2 > n1, enabling light confinement through total internal reflection at the interface between layers. This substitution of mechanical fiber-based structures with planar integrated structures significantly reduces device size while maintaining optical transmission performance.
Solution Approach 2:
The patent utilizes refractive index parameters to achieve waveguide functionality. By carefully selecting and configuring the refractive indices of different layers (substrate with n1, waveguide layer with n2 where n2 > n1, and cladding layer with n3 where n2 > n3), the patent creates conditions for total internal reflection that confine light within the waveguide structure. This parameter-based approach enables compact device design while maintaining optical performance.
2Reliability
If optical waveguides are made using traditional optical fiber methods, then the optical transmission performance is maintained, but the manufacturing cost increases
Solution Approach 1:
The patent replaces expensive traditional optical fiber manufacturing processes with a planar integrated circuit fabrication approach. The waveguide is formed by depositing and patterning dielectric layers on a substrate using standard semiconductor manufacturing techniques such as chemical vapor deposition (CVD) and photolithography. This substitution enables cost-effective mass production while maintaining optical transmission performance through precise control of layer thickness and refractive index.
Solution Approach 2:
The patent employs precise control of material parameters including refractive index, layer thickness, and composition to optimize waveguide performance. By adjusting these parameters during the fabrication process, the patent achieves effective light confinement and low insertion loss at a lower manufacturing cost compared to traditional optical fiber methods. The use of standard semiconductor fabrication processes further reduces cost while maintaining performance.
3Volume of stationary object
If a waveguide unit is formed from a photo-resist layer exposed by high energy light source, then the size and cost are reduced, but the manufacturing precision requirements increase
Solution Approach 1:
The patent employs photolithography to create a mask pattern before exposing the photo-resist layer to high energy light sources. This preliminary action defines the precise geometry and position of the waveguide structure before the actual waveguide formation occurs. The mask pattern serves as a template that ensures accurate placement and dimensional control of the high-refractive-index waveguide layer, thereby achieving manufacturing precision despite the complex multi-step process.
Solution Approach 2:
The patent controls the refractive index and thickness parameters of the photo-resist layer and subsequent dielectric layers to achieve precise waveguide characteristics. By adjusting the photo-resist layer thickness, exposure dose, and development conditions, the patent creates waveguides with controlled refractive index contrast and dimensional accuracy. This parameter control enables precise waveguide formation while maintaining reduced device size.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively reduces the size and cost of optical communication devices by utilizing a refractive index structure that enhances light transmission through total internal reflection, addressing the limitations of existing waveguide designs.
Implementation Method 1
featuring a refractive index structure that enables total internal reflection
Implementation Method 2
the waveguide unit is formed from a photo-resist layer by a high energy light source exposing
Data Source
AI summary
An optical communication transmitting device includes a substrate, a first layer with a first optical refractive index formed on the substrate, a waveguide unit formed with a second optical refractive index formed on the first layer, and a second layer with a third optical refractive index covered on the top of the waveguide unit. The second optical refractive index is greater than the first optical refractive index. The second optical refractive index is greater than the third optical refractive index. The waveguide unit is formed from a photo-resistor layer by a high energy light source exposure.