Plasma Processing Antenna Configuration for Expanded Generation Area

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Existing plasma processing apparatuses for rotating substrates face challenges in expanding the plasma generation area while maintaining cost-effectiveness, as they require complex configurations and additional power sources for multiple antennas.

Innovation Solution

A plasma processing apparatus with a main coiled antenna and an auxiliary coiled antenna, electrically insulated and positioned to cause electromagnetic induction, generates plasma across a larger area without overlapping projection areas, using a single high-frequency power source for the main antenna and leveraging electromagnetic induction to create additional plasma generation zones.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Area of stationary object

If a single main antenna is used for plasma generation, then the apparatus structure is simple and costs are low, but the plasma generation area is limited

Engineering Contradiction:
Improveplasma generation areaVSAvoidapparatus structure
Core Design Contradiction:
Area of stationary objectVSDevice complexity

Solution Approach 1:

The patent introduces an auxiliary antenna as an intermediary element that does not require its own power source. Instead, it leverages the electromagnetic field from the main antenna to generate plasma through electromagnetic induction, thereby expanding the plasma generation area without proportionally increasing system complexity

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The auxiliary antenna is designed to be self-powered through electromagnetic induction from the main antenna. The capacitive coupling between the main and auxiliary antennas allows the auxiliary antenna to generate its own plasma field without requiring an independent power supply, thus expanding coverage while maintaining cost-effectiveness

Inventive Principle:
Principle #25Self-service

2Area of stationary object

If multiple antennas with independent power sources are used, then the plasma generation area is expanded, but the costs and device complexity increase

Engineering Contradiction:
Improveplasma generation areaVSAvoidnumber of power sources
Core Design Contradiction:
Area of stationary objectVSQuantity of substance

Solution Approach 1:

The main antenna serves dual functions: it directly generates plasma in its own field and simultaneously acts as a power source for the auxiliary antenna through electromagnetic induction. This multi-functionality eliminates the need for separate power sources for each antenna, reducing overall system costs while maintaining expanded plasma coverage

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The electromagnetic field acts as an intermediary energy transfer mechanism between the main antenna and auxiliary antenna. This allows power to be transmitted wirelessly from the main antenna to the auxiliary antenna, eliminating the need for additional power sources and reducing system complexity

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration allows for an expanded plasma generation area without increasing costs, simplifying the apparatus structure and enabling flexible plasma density adjustment across the substrate, ensuring uniform plasma processing.

Implementation Method 1

a main antenna provided to face a passing area of the substrate and having a coiled shape configured to excite the process gas and to generate first induction coupled plasma when high frequency power is supplied thereto

Methodology Applied
Scientific EffectElectromagnetic induction: Electromagnetic Induction

Implementation Method 2

an auxiliary antenna having a coiled shape and kept electrically insulated from the main antenna at a position capable of causing electromagnetic induction with the main antenna... configured to excite the process gas and to generate second induction coupled plasma

Methodology Applied
Scientific EffectElectromagnetic induction: Electromagnetic Induction

Implementation Method 3

The induction current flowing through the auxiliary antenna is resonated by using a capacitor provided in a loop formed by the auxiliary antenna

Methodology Applied
Scientific EffectResonance: Resonance

Data Source

PatentUS9502215B2Plasma processing apparatus and plasma processing method
Publication Date: 2016.11.22 TOKYO ELECTRON LTD
  • US9502215B2 patent drawing
  • US9502215B2 patent drawing
  • US9502215B2 patent drawing

AI summary

A plasma processing apparatus is provided. According to the apparatus, a main antenna connected to a high frequency power source and an auxiliary antenna electrically insulated from main antenna is arranged. Moreover, projection areas when the main antenna and the auxiliary antenna are seen in a plan view are arranged so as not to overlap with each other. More specifically, the auxiliary antenna is arranged on a downstream side in a rotational direction of the turntable relative to the main antenna. Then, a first electromagnetic field is generated in the auxiliary antenna by way of an induction current flowing through the main antenna, and a second induction plasma is generated even in an area under the auxiliary antenna in addition to an area under the main antenna by resonating the auxiliary antenna.