Plasma Chamber Ceiling With Recessed Gas Feed and Wave Port
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Solution Overview
Problem
Existing plasma processing apparatuses with gas nozzles protruding from the ceiling wall are difficult and costly to manufacture, and they complicate the design and maintenance of the apparatus.
Innovation Solution
A plasma processing apparatus with a ceiling wall that has a recessed portion serving as a supply port for electromagnetic waves, featuring first gas supply holes on the lower surface of the ceiling wall and second gas supply holes on the inner surface of the recess portion, eliminating the need for protruding gas nozzles.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If gas nozzles protrude from the ceiling wall to supply gas, then gas supply function is achieved, but manufacturing cost and difficulty increase
Solution Approach 1:
The gas supply function is merged into the ceiling wall structure itself by forming gas supply holes directly in the ceiling wall. The ceiling wall integrates both structural support and gas supply functions, eliminating the need for separate protruding gas nozzles. This reduces manufacturing complexity and cost while maintaining the gas supply capability.
Solution Approach 2:
The gas supply function is extracted from a separate nozzle component and integrated directly into the ceiling wall structure. By forming gas supply holes in the ceiling wall, the invention removes the need for additional protruding nozzle parts, simplifying the overall structure and reducing manufacturing difficulty.
2Ease of operation
If gas nozzles protrude from the ceiling wall, then gas supply is enabled, but apparatus design and maintenance become complicated
Solution Approach 1:
The ceiling wall is designed to integrate multiple functions: structural support, electromagnetic wave transmission (via transmission windows), and gas supply (via gas supply holes). This functional integration simplifies the overall apparatus design by reducing the number of separate components and their associated maintenance requirements.
Solution Approach 2:
The ceiling wall serves multiple purposes simultaneously: it provides structural support for the processing chamber, transmits electromagnetic waves through integrated transmission windows, and supplies gas through integrated gas supply holes. This multi-functionality reduces design complexity and maintenance burden compared to separate specialized components.
3Reliability
If gas is supplied from the ceiling wall, then plasma generation is achieved, but particle generation and abnormal discharge may occur
Solution Approach 1:
The gas supply holes are positioned and oriented with specific local characteristics to control gas flow patterns. By adjusting the location, orientation, and dimensions of gas supply holes in the ceiling wall, the invention creates optimized local flow conditions that promote stable plasma generation while minimizing particle formation and abnormal discharge.
Solution Approach 2:
The invention optimizes parameters such as gas supply hole diameter, orientation angle, and position relative to the processing chamber to control gas flow characteristics. By changing these parameters, the system achieves stable plasma generation while reducing harmful effects like particle generation and abnormal discharge.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design simplifies the manufacturing and maintenance of the apparatus, reduces the risk of particle generation and abnormal discharge, and enhances the activation efficiency of gases in the plasma processing environment.
Implementation Method 1
a transmission window configured to close the opening, wherein the opening under the transmission window is formed as a recess portion, wherein the recess portion is a supply port for supplying electromagnetic waves from the transmission window into the processing container
Implementation Method 2
first gas supply holes are formed on a lower surface of the ceiling wall, and wherein second gas supply holes are formed on an inner surface of the recess portion
Data Source
AI summary
A plasma processing apparatus includes: a processing container; a ceiling wall forming a part of the processing container and including an opening; and a transmission window configured to close the opening, wherein the opening under the transmission window is formed as a recess portion, wherein the recess portion is a supply port for supplying electromagnetic waves from the transmission window into the processing container, wherein first gas supply holes are formed on a lower surface of the ceiling wall, and wherein second gas supply holes are formed on an inner surface of the recess portion.