Plasma Processing Chamber Segmentation for Targeted Maintenance

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Solution Overview

Problem

Conventional plasma processing apparatuses require disassembling all components for maintenance, even when only a part is targeted, leading to inefficient maintenance operations.

Innovation Solution

A plasma processing apparatus with a vertically two-divided processing chamber configuration, allowing for selective detachment and reassembly of components using elevating and fixing mechanisms, enabling efficient maintenance without disassembling the entire chamber.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of repair

If the processing chamber is disassembled into individual pieces for maintenance, then the components can be independently maintained, but the disassembly and assembly operations become time-consuming and complex

Engineering Contradiction:
ImproveIndependent maintenance of componentsVSAvoidMaintenance time
Core Design Contradiction:
Ease of repairVSLoss of time

Solution Approach 1:

The processing chamber is segmented into modular components (lid body, bottom member, cylindrical electrode, insulating materials) that can be independently maintained. The holding member integrates these segments, allowing selective disassembly of only the required component for maintenance while keeping other parts assembled, thus reducing maintenance time compared to complete disassembly.

Inventive Principle:
Principle #1Segmentation

2Ease of repair

If all components are disassembled for maintenance, then any component can be accessed, but the operational efficiency is reduced due to complete disassembly requirements

Engineering Contradiction:
ImproveAccess to any componentVSAvoidOperational efficiency
Core Design Contradiction:
Ease of repairVSProductivity

Solution Approach 1:

The holding member provides a dynamic assembly system where components can be selectively attached and detached. This allows the processing chamber to transition between fully assembled and partially disassembled states, enabling maintenance of specific components without requiring complete disassembly, thereby maintaining higher operational efficiency.

Inventive Principle:
Principle #15Dynamics

3Ease of operation

If the cylindrical electrode and insulating materials are held integrally by the holding member, then disassembly and assembly operations are simplified, but maintenance of individual components becomes less flexible

Engineering Contradiction:
ImproveDisassembly and assembly operationsVSAvoidMaintenance flexibility
Core Design Contradiction:
Ease of operationVSAdaptability or versatility

Solution Approach 1:

The holding member serves multiple functions: it integrates the cylindrical electrode and insulating materials for simplified handling during assembly, yet allows selective release of individual components for maintenance. This multi-functionality enables both simplified operations and flexible maintenance access, resolving the contradiction between operational simplicity and maintenance adaptability.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Facilitates quick and efficient maintenance by allowing targeted disassembly and reassembly of components, reducing maintenance time and improving operational efficiency.

Implementation Method 1

The high-frequency power supply unit applies high-frequency voltage to the cylindrical electrode

Methodology Applied
Scientific EffectHigh-frequency voltage application to generate plasma: Electromagnetic Induction

Implementation Method 2

annular permanent magnets which are provided on the outer circumferential surfaces of the upper and lower insulating materials respectively

Methodology Applied
Scientific EffectMagnetic field generation: Magnetism

Data Source

PatentEP2256792B1Plasma processing apparatus
Publication Date: 2019.03.13 SPP TECHNOLOGIES CO LTD
  • EP2256792B1 patent drawingFigure 1
  • EP2256792B1 patent drawingFigure 2
  • EP2256792B1 patent drawingFigure 3

AI summary

The present invention relates to a plasma processing apparatus in which it is possible to efficiently perform maintenance of a processing chamber. A plasma processing apparatus 1 has a processing chamber 11 including a lower chamber 12 and an upper chamber 13, a platen 20 on which a silicon substrate K is placed, a processing gas supply device 27, coils 32, high-frequency power supply unit for coil 33, an elevating board 41 with a through hole 41 a provided to be vertically movable, an elevating mechanism 42 for supporting and moving up and down the elevating board 41, and a fixing mechanism 46 for fixing the upper chamber 13. The fixing member 46 is configured from a fixing board 47, first fixing bolts 48, 49 for connecting and fixing an top plate 16 to the elevating board 41 using the fixing board 47, second fixing bolts 50 for fixing a flange portion 32b of a holding member 32 to an annular plate 14, and third fixing bolts 51 for fixing the annular plate 14 to a sidewall 12a of the lower chamber 12.