Plasma Processing Device With Independently Movable Electromagnets
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Solution Overview
Problem
Plasma processing devices face difficulties in maintaining symmetry of plasma density when concentric electromagnets are moved, leading to non-uniform etching rates on substrates.
Innovation Solution
A plasma processing device with independently movable electromagnet sections on a top chamber, allowing for precise control of magnetic fields to adjust plasma density uniformly across the substrate by relocating electromagnet sections based on stored location information for specific substrate types and etching conditions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If concentric electromagnets are moved to adjust plasma density, then plasma density uniformity can be improved, but maintaining symmetry of plasma density becomes difficult
Solution Approach 1:
The electromagnet system is divided into multiple independent electromagnet sections that can be moved separately. This segmentation allows each section to be positioned independently to compensate for local plasma density variations while maintaining overall symmetry through coordinated control of multiple sections.
Solution Approach 2:
The electromagnet sections are made movable rather than fixed, enabling dynamic adjustment of their positions to optimize plasma density distribution. The ability to relocate electromagnet sections allows the system to adapt to different plasma conditions and maintain symmetry during operation.
2Ease of operation
If electromagnet sections are made independently movable, then ease of adjusting plasma density is improved, but device complexity increases
Solution Approach 1:
The electromagnet system is divided into multiple independently controllable sections, each capable of being moved separately. This segmentation enables granular control over plasma density adjustments while the modular structure manages complexity through standardized independent units.
Solution Approach 2:
The positions of electromagnet sections are adjusted as variable parameters to control plasma density. By treating electromagnet locations as adjustable parameters rather than fixed structural elements, the system gains operational flexibility while managing complexity through parameter-based control.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables easy maintenance of plasma density symmetry, resulting in uniform etching rates and improved processing outcomes by adjusting the positions of electromagnet sections to match plasma density variations.
Implementation Method 1
an electromagnet section. The electromagnet section is provided in each of a plurality of regions, which are provided on a top of the chamber in an upper part thereof, so as to be independently movable
Data Source
AI summary
A plasma processing device includes a chamber; a substrate stage that supports a substrate inside the chamber; a plasma generator that generates plasma by which the substrate is processed in a space above the substrate inside the chamber; and an electromagnet. The electromagnet is provided in each of a plurality of regions, which are provided on a top of the chamber in an upper part thereof, so as to be independently movable. The plasma processing device further includes a controller configured to move the electromagnet to produce a uniform plasma density onto the substrate.