Plasma Processing Filter Coils Vertical Stacking
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Solution Overview
Problem
In plasma processing apparatuses, increasing the number of heaters in the electrostatic chuck complicates space arrangement for filters, leading to longer wiring lengths and deteriorated frequency characteristics due to parasitic components, necessitating a solution to shorten these wirings.
Innovation Solution
A plasma processing apparatus design featuring a filter device with coaxially arranged coil groups surrounding a conductor pipe, connected to the electrostatic chuck through a structured wiring system that maintains consistent coil lengths and reduces impedance frequency differences, allowing for efficient high-frequency power filtering.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the number of heaters in the electrostatic chuck is increased to improve temperature control, then the temperature distribution control capability is improved, but the space for arranging filters becomes insufficient and wiring lengths increase
Solution Approach 1:
The filter arrangement is moved from a horizontal layout outside the chamber to a vertical stacked configuration below the chamber. Multiple filters are arranged in the vertical dimension along the power supply lines, transforming a two-dimensional space problem into a three-dimensional solution that accommodates more heaters without increasing horizontal space requirements.
Solution Approach 2:
The filters are positioned to surround the power feeding unit vertically, with multiple filters nested along the same spatial corridor. This nesting approach allows multiple filter components to occupy overlapping or adjacent vertical spaces, maximizing space utilization and keeping wiring lengths short.
2Manufacturing precision
If the number of heaters is increased, then temperature control capability is improved, but wiring lengths increase causing frequency characteristic deterioration
Solution Approach 1:
By arranging filters vertically below the chamber rather than horizontally outside, the power supply lines remain short and localized. This vertical stacking maintains electrical connection integrity by minimizing the length of wirings that would otherwise extend horizontally across large distances, thus preserving frequency characteristics even with multiple heaters.
3Reliability
If filters are arranged outside the chamber, then high frequency power filtering is achieved, but the distance between electrostatic chuck and coils increases
Solution Approach 1:
The filters are extracted from the traditional horizontal external arrangement and repositioned to a vertical location directly below the chamber. This extraction and relocation allows the filters to remain functionally external (still filtering high frequency power) while physically being positioned closer to the electrostatic chuck through the vertical power supply path.
4Reliability
If wiring lengths are shortened, then frequency characteristics are improved, but space arrangement becomes more constrained
Solution Approach 1:
The solution uses the vertical dimension below the chamber to arrange multiple filters in a stacked configuration. This vertical arrangement naturally limits wiring lengths since all filters connect to the electrostatic chuck through the vertical power supply path, while simultaneously accommodating multiple heaters by utilizing the vertical space rather than competing for horizontal space.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively prevents high-frequency power from reaching the heater controller, maintains impedance frequency characteristics, and allows for a compact arrangement of filters directly below the chamber, thereby shortening wiring lengths and improving frequency performance.
Implementation Method 1
The filter device is configured to prevent a high frequency power from flowing into a heater controller from the heaters. The filter device includes the coils, a plurality of capacitors and a housing. The capacitors are respectively connected between the coils and the ground.
Implementation Method 2
Each of the filters includes a coil and a capacitor as described in Japanese Patent Application Publication No. 2014-99585. The filter device includes the coils, a plurality of capacitors and a housing.
Implementation Method 3
The capacitors are respectively connected between the coils and the ground. Each of the filters includes a coil and a capacitor as described in Japanese Patent Application Publication No. 2014-99585.
Implementation Method 4
The supporting table includes a lower electrode and an electrostatic chuck. The electrostatic chuck is provided on the lower electrode.
Data Source
AI summary
In a plasma processing apparatus, a high frequency power source is electrically connected to a lower electrode of a supporting table through a power feeding unit. The power feeding unit is surrounded by a conductor pipe outside the chamber. An electrostatic chuck of the supporting table has therein a plurality of heaters. A filter device is provided between the heaters and a heater controller. The filter device includes a plurality of coil groups, each of the coil groups including two or more coils. In each of the coil groups, the two or more coils are arranged such that winding portions of the two or more coils extend in a spiral shape around a central axis and turns of the winding portions are arranged sequentially and repeatedly, and the coil groups are provided coaxially to the central axis to surround the conductor pipe directly below the chamber.