Plasma-Based Gas Detector for Purifier Monitoring

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Solution Overview

Problem

Current gas purifiers in manufacturing and analytical industries face challenges in accurately determining their end-of-life, leading to inefficient purification, instrument malfunctions, and potential safety hazards due to impurity buildup and lack of real-time monitoring capabilities, especially in low-flow laboratory settings where expensive monitoring instruments are not financially justifiable.

Innovation Solution

A plasma-based detector system that generates a plasma in a discharge chamber, measuring breakdown voltage and optical emissions to determine gas composition and pressure, providing real-time monitoring and notification of impurity levels, allowing for precise detection of purifier performance and potential failures.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If expensive analytical instruments (gas chromatograph or mass spectrometer) are used to monitor gas purity, then measurement precision is improved, but device complexity and cost increase significantly

Engineering Contradiction:
Improvegas purity measurement precisionVSAvoiddevice complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent employs a simple, low-cost plasma-based detector that can be easily manufactured and replaced if needed, rather than relying on expensive, complex analytical instruments. The detector uses basic components (electrodes, discharge chamber, photodetector) that are inexpensive and can serve the monitoring function effectively without the complexity of gas chromatographs or mass spectrometers.

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

Solution Approach 2:

The patent replaces complex mechanical and analytical instrumentation with a plasma-based optical detection system. Instead of using mechanical gas chromatography columns or complex mass spectrometry systems, the invention uses plasma discharge and optical emission detection to measure gas purity, significantly simplifying the device while maintaining measurement capability.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Reliability

If no monitoring system is used, then device complexity is reduced, but reliability deteriorates due to undetected purifier failure

Engineering Contradiction:
Improvepurifier performance monitoringVSAvoiddevice complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent implements a feedback mechanism where the plasma detector continuously monitors gas purity and provides real-time information about purifier performance. The system detects changes in plasma emission characteristics that indicate purifier degradation or failure, enabling timely intervention before complete failure occurs, thus improving reliability without requiring complex monitoring infrastructure.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The purifier system performs self-diagnosis through the plasma detector that monitors its own output gas purity. The system uses the plasma discharge itself as both the measurement tool and the diagnostic indicator, eliminating the need for separate, complex monitoring equipment while maintaining continuous reliability assessment.

Inventive Principle:
Principle #25Self-service

3Loss of information

If gas purifier operates without real-time monitoring, then device complexity is lowered, but loss of information occurs regarding impurity levels and purifier status

Engineering Contradiction:
Improvegas composition informationVSAvoiddevice complexity
Core Design Contradiction:
Loss of informationVSDevice complexity

Solution Approach 1:

The patent utilizes optical emission spectroscopy of plasma, where different gas species emit characteristic wavelengths of light (color changes). By analyzing the spectral emission from the plasma discharge, the system identifies and quantifies different gas components and impurities, providing continuous composition information through simple optical detection rather than complex analytical instrumentation.

Inventive Principle:
Principle #32Color changes

Data Source

PatentUS11474043B2Plasma-based detector and methods using the same for measuring and monitoring properties of a gas flow
Publication Date: 2022.10.18 9518-1236 QUEBEC INC
  • US11474043B2 patent drawing
  • US11474043B2 patent drawing
  • US11474043B2 patent drawing

AI summary

There is provided a method for measuring a composition of a gas circulating through a plasma-based detector, the plasma-based detector having a discharge chamber defining an internal volume and having discharge electrodes configured to apply a plasma-generating field across the discharge chamber. The method includes ramping a voltage until it reaches a breakdown voltage to generate a plasma, detecting the presence of the plasma, determining a pressure based on the breakdown voltage upon detection of the presence of the plasma, operating the detector at an operation voltage greater than the breakdown voltage, performing measurement(s) on the plasma, generating a detector signal based the measurement(s) and compensating the detector signal based on the determined pressure to obtain a compensated detector signal, the compensated detector signal being representative of the composition of the gas. A plasma-based detector for measuring the composition of the gas is also provided.