Plasma Processing Apparatus Gas Space Discharge Suppression
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Solution Overview
Problem
Existing plasma processing apparatuses face challenges in sufficiently suppressing abnormal discharges in the gas space due to high frequency voltage, leading to unstable plasma processing.
Innovation Solution
A plasma processing apparatus with a high frequency power source connected between a reference electrode and a base stand, incorporating a gas storage unit and a blocking mechanism that blocks the gas introducing port to maintain the gas at the same potential as the base stand, preventing potential differences and suppressing abnormal discharges.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If cooling gas is supplied to the gap between substrate and base stand, then substrate cooling is achieved, but abnormal discharge occurs in the gas space
Solution Approach 1:
The gas space is segmented into multiple regions by providing partition walls that extend from the base stand toward the substrate. This divides the continuous gas space into separate zones, reducing the path length for electrical discharge and weakening the electric field strength across the gas space, thereby suppressing abnormal discharge while maintaining cooling functionality.
Solution Approach 2:
Partition walls are introduced as intermediary structures within the gas space. These walls act as physical barriers that interrupt the direct electrical field path through the cooling gas, serving as mediators that prevent abnormal discharge without interfering with the thermal conduction function of the cooling gas.
2Reliability
If partition walls are added to suppress abnormal discharge, then plasma processing stability improves, but device complexity increases
Solution Approach 1:
The partition walls are merged with the base stand structure, forming an integrated component rather than separate additions. The partition walls are provided as protrusions from the base stand surface, combining the base stand's support function with the partition walls' discharge suppression function into a single unified structure.
Solution Approach 2:
The base stand is designed to serve multiple functions simultaneously: it provides mechanical support for the substrate, conducts heat away from the substrate through cooling channels, and suppresses abnormal discharge through integrated partition walls. This multi-functionality reduces the need for separate components.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively suppresses abnormal discharges in the gas space, ensuring stable plasma processing by maintaining the gas at the same potential as the base stand, even when high frequency voltage is applied.
Implementation Method 1
a high frequency power source connected between a reference electrode and a base stand
Implementation Method 2
a blocking mechanism configured to block a gas introducing port of the gas storage unit... maintaining the gas at the same potential as the base stand, preventing potential differences and suppressing abnormal discharges
Data Source
AI summary
A plasma processing apparatus and a plasma processing method are provided which can sufficiently suppress an abnormal discharge in a gas space. A plasma processing apparatus includes a high frequency power source connected between a processing chamber and a base stand; a gas storage unit provided within the base stand and configured to store a gas; a blocking mechanism configured to block a gas introducing port of the gas storage unit; and a connection unit configured to connect a space between a disposition position of a wafer and the base stand, to the gas storage unit.