Plasma Generator Coil and Capacitor Configuration
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Solution Overview
Problem
Conventional plasma generator systems face issues with ion bombardment and sputtering of components due to high voltage application, leading to shortened component lifespan and increased maintenance costs, and plasma density variations during transfer from small to large diameter regions, resulting in longer process durations.
Innovation Solution
The improved plasma generator system features a container with a shaped plasma chamber and a coil configuration that includes multiple windings to minimize ion bombardment, using a capacitor to limit voltage and enhance impedance matching, and a gas flow distribution receptacle with angled openings to uniformly distribute processing gas, reducing plasma density variations and component wear.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If high voltage is applied to the coil to maintain plasma production, then plasma quality is improved, but ion bombardment and sputtering of tube surfaces increases, shortening component lifespan
Solution Approach 1:
A Faraday shield is introduced as an intermediary component between the coil and the tube. This conductive shield captures ions generated in the plasma, preventing them from bombarding the tube surface. The shield is connected to ground or a voltage source that attracts ions away from the tube, thereby protecting the tube from sputtering while allowing the coil to operate at high voltage for quality plasma production.
Solution Approach 2:
The Faraday shield is designed as a sacrificial component that can be easily replaced. Instead of protecting the expensive tube from ion damage, the system uses a cheaper, easily replaceable shield that absorbs the ion bombardment damage. When the shield becomes damaged or depleted, it is replaced rather than the tube, significantly reducing maintenance costs and downtime.
2Area of stationary object
If plasma flows from a small diameter plasma region to a large diameter distribution region, then plasma coverage area is increased, but plasma density decreases, extending process duration
Solution Approach 1:
The plasma chamber is designed with non-uniform cross-sectional geometry, featuring a smaller diameter plasma generation region that transitions to a larger diameter distribution region. This local variation in geometry allows the plasma to be generated in a concentrated high-density zone, then expand to cover a larger area while maintaining adequate density for process effectiveness. The transition region is specifically shaped to minimize density loss during expansion.
Solution Approach 2:
The system uses dynamic control of plasma parameters including gas flow rates, power delivery to the coil, and pressure conditions to maintain plasma density during the transition from the small generation region to the large distribution region. By dynamically adjusting these parameters, the system compensates for the natural density decrease during expansion, ensuring consistent process performance across the entire plasma coverage area.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration reduces ion bombardment and sputtering, extends the useful life of system components, decreases maintenance costs, and maintains plasma density uniformity, thereby shortening processing times and improving overall system efficiency.
Implementation Method 1
the coil is energized to create an electric field across the plasma chamber
Implementation Method 2
As the processing gas flows through the electric field, a portion of the processing gas transforms into a plasma, which may include species such as electrons, ions, and reactive radicals
Implementation Method 3
using a capacitor to limit voltage and enhance impedance matching
Implementation Method 4
The coil may include a first winding extending from a first end and a second winding extending to a second end of the coil
Data Source
AI summary
Systems and methods of forming plasma are provided. In an embodiment, a plasma generator system is provided including a container, a single coil disposed around the container, the single coil being a single member and having a first end, a second end, a first winding, and a second winding, wherein the first winding extends from the first end, and the second winding is integrally formed as part of the first winding and extends to the second end, an energy source electrically coupled directly to the first end of the single member, and a capacitor electrically coupled directly to the second end of the single member.