Plasma Generator Pulse Scheduling for Multi-Chamber Power Sharing
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Solution Overview
Problem
Existing plasma generators are inefficient as they typically operate with a single process chamber, leading to unused power and increased costs due to the need for multiple generators when handling multiple process chambers, especially in applications requiring pulsed electrical power with frequencies of at least 40KHz.
Innovation Solution
A plasma generator system that coordinates power delivery to multiple process chambers using a control unit to manage power requirements, shifting and dividing pulses in time to avoid overlap and ensure efficient energy distribution, allowing for simultaneous operation of multiple chambers with a reduced number of generators.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a single plasma generator is assigned to each process chamber, then each chamber can be operated independently with dedicated power supply, but the number of plasma generators increases leading to higher costs and lower efficiency
Solution Approach 1:
The patent applies multi-functionality by enabling a single plasma generator to serve multiple process chambers through a switching unit. The plasma generator can be dynamically assigned to different chambers based on process requirements, allowing one generator to perform the function of multiple dedicated generators while maintaining independent operation capability for each chamber.
Solution Approach 2:
The patent implements dynamics through the switching unit that can dynamically reconfigure the connection between the plasma generator and different process chambers. This dynamic switching capability allows the system to adapt the plasma generator assignment in real-time based on process demands, replacing static one-to-one assignments with flexible many-to-many connections.
2Productivity
If pulsed electrical power is provided to multiple process chambers simultaneously, then all chambers can be operated at the same time, but pulse overlap occurs leading to power distribution conflicts
Solution Approach 1:
The patent applies periodic action by implementing time-multiplexed pulse distribution to multiple process chambers. The switching unit sequentially directs pulsed power to different chambers in a coordinated manner, ensuring that pulses are distributed in periodic cycles without overlapping in time, thereby enabling simultaneous operation of multiple chambers while avoiding power conflicts.
Solution Approach 2:
The patent ensures continuity of useful action by maintaining continuous monitoring and control of pulse distribution across multiple chambers. The control unit continuously coordinates the timing and routing of pulsed power, ensuring that the useful action of plasma generation continues without interruption across all chambers through seamless temporal coordination.
3Productivity
If the switching unit directs pulses to multiple outputs simultaneously, then all process chambers receive power at the same time, but power requirements conflict causing energy distribution inefficiency
Solution Approach 1:
The patent implements periodic action through time-division multiplexing of power delivery to multiple process chambers. The switching unit distributes pulsed power to different chambers in sequential time slots rather than simultaneously, ensuring that each chamber receives the required power in periodic cycles while avoiding energy conflicts and distribution inefficiencies.
Solution Approach 2:
The patent applies parameter changes by dynamically adjusting the timing parameters of pulse distribution to different process chambers. The control unit modifies pulse width, pulse frequency, and inter-pulse intervals based on the specific power requirements of each chamber, optimizing energy distribution efficiency while maintaining concurrent operational capability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution significantly reduces the number of plasma generators required, increases efficiency, and allows for flexible power distribution to meet varying process demands, enhancing the utilization of available power and reducing operational costs.
Implementation Method 1
a switching unit (12) having a first input connected to the output of the power supply and at least two switching unit outputs for respective connection to one of the at least two process chambers; wherein the switching unit is adapted to form an alternating current with a predetermined frequency of at least 40KHz as an output signal from a direct current at the input
Implementation Method 2
Electrical power with a frequency of at least 40KHz is then applied to the wafer boats in order to generate a plasma from a suitable process gas between the plates and between wafers held on the plates
Data Source
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AI summary
A plasma generator and a method for pulsed supply of electrical power at a frequency of at least 40 kHz to at least two process chambers are described. The plasma generator comprises the following: a control unit suitable for obtaining and evaluating process data about processes in the at least two process chambers, an adjustable power supply with an output suitable for outputting a direct current with a predetermined voltage and/or amplitude in response to a control signal from the control unit, and a switching unit with a first input connected to the output of the power supply and with at least two switching unit outputs for connection to one of the at least two process chambers.The switching unit is capable of converting a direct current input into an alternating current with a predetermined frequency of at least 40 kHz as an output signal and, responding to a control signal from the control unit, selectively outputting this signal as a pulse for a predetermined pulse duration to one of the switching unit outputs. The control unit is capable of coordinating the power requirements of at least two process chambers and controlling the power supply and the switching unit in such a way that the power corresponding to the power requirements is provided as pulses at the respective switching unit outputs connected to the process chambers over a period of time. The pulses of the respective process chambers are temporally offset from each other so that the process chambers can be operated simultaneously.