Plasma-Treated Heat Spreader Surface for FCBGA-H TIM Adhesion
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Solution Overview
Problem
The adhesion and bond-ability between heterogeneous interfaces of semiconductor die and heat spreaders, such as nickel-plated copper, are less effective compared to homogeneous interfaces, leading to potential delamination issues.
Innovation Solution
A plasma-enhanced surface treatment is applied to the heat spreader, creating a rougher surface with carbon-oxygen bonds and activated chemical groups that enhance tackiness and adhesion properties, improving the bond between the heat spreader and thermal interface material (TIM).
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If a smooth nickel-plated copper heat spreader is used, then the heat spreader provides good thermal conductivity, but the adhesion between the heat spreader and TIM is insufficient
Solution Approach 1:
The patent applies local quality by treating only the surface of the heat spreader that contacts the TIM with plasma treatment, while the bulk material remains nickel-plated copper for thermal conductivity. This creates different properties in different regions: the bulk maintains thermal performance while the surface gains adhesion properties through plasma-induced roughness and chemical activation.
Solution Approach 2:
The plasma treatment changes the physical and chemical parameters of the heat spreader surface. The surface roughness increases, chemical composition changes (creation of carbon-oxygen bonds and activated groups), and surface energy increases. These parameter changes enhance adhesion without altering the bulk thermal conductivity properties of the nickel-plated copper material.
2Strength
If plasma treatment is applied to the heat spreader surface, then adhesion and bondability are enhanced, but the manufacturing process becomes more complex
Solution Approach 1:
The plasma treatment is applied as a preliminary action before TIM deposition. By pre-treating the heat spreader surface with plasma to create the desired roughness and chemical activation, the subsequent TIM deposition process becomes simpler and more effective. This preliminary preparation prevents adhesion problems before they occur rather than requiring complex post-processing.
Solution Approach 2:
The patent replaces mechanical surface preparation methods (such as abrasion or chemical etching) with plasma treatment. Plasma provides a cleaner, more controllable, and environmentally friendly approach to surface modification. The plasma process uses ionized gas to achieve surface activation without the mechanical complexity or waste associated with traditional methods.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The plasma-enhanced surface treatment enhances the adhesion and bondability between the heat spreader and TIM, reducing the risk of delamination and ensuring effective heat dissipation.
Implementation Method 1
A plasma-enhanced surface treatment is applied to the heat spreader, creating a rougher surface with carbon-oxygen bonds and activated chemical groups
Implementation Method 2
creating a rougher surface with carbon-oxygen bonds and activated chemical groups that enhance tackiness and adhesion properties
Implementation Method 3
The TIM dissipates heat by effectively increasing the contact area between the semiconductor die and heat spreader
Data Source
AI summary
A semiconductor device has a substrate and an electrical component disposed over the substrate. A heat spreader with a plasma-enhanced surface is disposed over the electrical component. A TIM is disposed between the electrical component and plasma-enhanced surface of the heat spreader. The TIM can be deposited on the electrical component or plasma-enhanced surface. The plasma-enhanced surface contains argon ions and oxygen ions. The heat spreader is disposed in a reaction chamber. Reactant gases, such as argon and oxygen, are introduced into the reaction chamber. An electric field is formed within the reaction chamber to ionize the argon and oxygen and form the plasma-enhanced surface. The plasma-enhanced surface has properties of roughness and tacky-ness or adhesive property by nature of the surface exhibiting a chemical bonding group. An underfill material is deposited between the electrical component and substrate. The electrical component can be a flipchip type semiconductor die.


