Movable Plasma Chamber Insert for Radial Uniformity Control
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Solution Overview
Problem
Existing plasma strip tools face challenges in achieving uniformity control without requiring hardware changes, which disrupt the vacuum and are difficult to adjust during processing.
Innovation Solution
A plasma processing apparatus with a movable insert in the plasma chamber allows for vertical positioning adjustments, enabling active control of plasma diffusion and uniformity from center to edge without hardware changes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If uniformity control is achieved by manipulating process parameters (gas pressure, flow, RF power), then process performance is improved, but control flexibility and response time are limited
Solution Approach 1:
The patent introduces a movable insert that can be dynamically adjusted to different vertical positions within the plasma chamber. This dynamic positioning capability allows real-time adjustment of plasma diffusion characteristics and radial uniformity without requiring hardware changes or breaking vacuum, directly resolving the contradiction between manufacturing precision and adaptability
Solution Approach 2:
The movable insert changes the physical configuration parameter (vertical position) to control plasma species diffusion and radial uniformity. By adjusting the insert's position, the system dynamically modifies plasma transport characteristics, providing flexible control over process uniformity while maintaining process stability
2Manufacturing precision
If hardware changes are made to improve uniformity control, then manufacturing precision is improved, but vacuum disruption and operational complexity increase
Solution Approach 1:
The movable insert provides a dynamic adjustment mechanism that eliminates the need for static hardware changes. The insert can be repositioned vertically during processing to optimize uniformity, avoiding vacuum disruption and the operational complexity associated with hardware modifications
Solution Approach 2:
The patent replaces mechanical hardware changes (such as replacing separation grids or chamber components) with a movable insert mechanism. This substitution allows uniformity control through positional adjustment rather than physical hardware modification, maintaining vacuum integrity and simplifying operations
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution provides tunable radial uniformity and efficiency during workpiece processing, allowing for adjustments during processing without breaking the vacuum, thus improving ash rate performance.
Implementation Method 1
an inductively coupled plasma source configured to generate a plasma in the plasma chamber
Implementation Method 2
enabling active control of plasma diffusion and uniformity from center to edge
Implementation Method 3
The separation grid can be transparent to neutral species but not transparent to charged particles from the plasma
Data Source
AI summary
Plasma processing apparatus for processing a workpiece are provided. In one example embodiment, a plasma processing apparatus for processing a workpiece includes a processing chamber, a plasma chamber separated from the processing, and an inductively coupled plasma source configured to generate a plasma in the plasma chamber. The apparatus includes a pedestal disposed within the processing chamber configured to support a workpiece. The apparatus includes an insert disposed in the plasma chamber movable to one or more vertical positions within the plasma chamber. Methods for processing of workpieces are also provided.