Microwave Plasma Ion Source Aperture Matching for Stable Ion Output

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Solution Overview

Problem

Existing microwave driven plasma ion sources face challenges in optimizing operation parameters for maximized sample ion generation, especially when used with different instrumentation such as ion mobility analysers and mass analysers.

Innovation Solution

The microwave driven plasma ion source includes a shielding with a shielding aperture that is fluidly coupled to the plasma torch outlet, where the size of the shielding aperture is less than 150% of the torch aperture, allowing for stable and efficient ionization and optimization of operation parameters.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the shielding aperture size is increased to allow more ions to pass through, then the ion transmission efficiency is improved, but the microwave shielding effectiveness deteriorates

Engineering Contradiction:
Improveion transmission efficiencyVSAvoidmicrowave shielding effectiveness
Core Design Contradiction:
ProductivityVSObject-affected harmful factors

Solution Approach 1:

The patent applies parameter changes by precisely controlling the shielding aperture size to be less than 150% of the torch aperture size. This quantitative parameter specification optimizes the balance between ion transmission and microwave shielding, resolving the contradiction between these two competing requirements.

Inventive Principle:
Principle #35Parameter changes

2Productivity

If the operation parameters are optimized for a specific instrumentation, then the sample ion generation is maximized, but the adaptability to different instrumentation deteriorates

Engineering Contradiction:
Improvesample ion generationVSAvoidinstrumentation compatibility
Core Design Contradiction:
ProductivityVSAdaptability or versatility

Solution Approach 1:

The patent achieves universality by designing a standardized interface between the plasma torch and shielding components. The consistent aperture relationship (shielding aperture < 150% of torch aperture) creates a universal connection that maintains optimal ion generation across different instrumentation applications, including ion mobility analysers and mass analysers.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration enables simple and stable optimization of operation parameters for maximized sample ion generation, reducing the complexity of parameter adjustment when used with different instrumentation.

Implementation Method 1

plasma gas is inserted into the inside of the plasma torch for generating a plasma by inductively coupling the plasma gas, to an electromagnetic field generated by the microwave resonator being exposed to the microwaves generated by the microwave generator

Methodology Applied
Scientific EffectElectromagnetic induction: Electromagnetic Induction

Implementation Method 2

the sample is introduced into the inside of the plasma torch and exposed to the plasma for being ionised to the sample ions

Methodology Applied
Scientific EffectPlasma ionization: Ionisation

Data Source

PatentUS12207383B2Microwave driven plasma ion source
Publication Date: 2025.01.21 TOFWERK
  • US12207383B2 patent drawing
  • US12207383B2 patent drawing
  • US12207383B2 patent drawing

AI summary

The invention relates to a microwave driven plasma ion source (1) for ionising a sample to be ionised to sample ions, the microwave driven plasma ion source (1) including a sample intake (6) for inserting the sample from an outside of the microwave driven plasma ion source (1) into an inside (3) of the microwave driven plasma ion source (1): a microwave generator (10) for generating microwaves for generating a plasma (101) from a plasma gas (100): a plasma torch (20) providing a plasma torch orientation direction (29) having an inside (21) for housing (2) a process of generation of the plasma (101) from the plasma gas (100) and for housing a process of ionising the sample to the sample ions by exposing the sample to the plasma (101), wherein the plasma torch (20) comprises a torch outlet (22) for letting out the plasma (101) and the sample ions from the inside (21) of the plasma torch (20) essentially in the plasma torch orientation direction (29) to an outside of the plasma torch (20), the torch outlet (22) having a torch aperture. Furthermore the microwave driven plasma ion source (1, 201) includes a shielding (4) for shielding off the microwaves from passing from the inside (3) of the microwave driven plasma ion source (1) to the outside of the microwave driven plasma ion source (1), wherein the shielding (4) comprises a shielding outlet (5) for letting out the plasma (101) and the sample ions from the inside (3) of the microwave driven plasma ion source (1) essentially in the plasma torch orientation direction (29) to the outside of the microwave driven plasma ion source (1), the shielding outlet (5) having a shielding aperture. Thereby, the shielding outlet (5) is fluidly coupled to the torch outlet (22) for letting out the plasma (101) and the sample ions from the inside (21) of the plasma torch (20) essentially in the plasma torch orientation direction (29) to the outside of the microwave driven plasma ion source (1), wherein a size of the shielding aperture is less than 150%, preferably less than 125%, particular preferably less than 110% of a size of the torch aperture, wherein both the size of the shielding aperture and the size of the torch aperture are measured in units of area.