Ranging Apparatus for Plasma Chamber Position Measurement
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Solution Overview
Problem
Existing ranging apparatuses face challenges in accurately measuring the position of objects within a plasma processing chamber without exposing the internal space to the atmosphere, which limits their precision and reliability.
Innovation Solution
A ranging apparatus comprising external light emitting and receiving devices, a base wafer with optical circuits, and a chamber-inside device that uses collimators and vertical focusers to deflect and measure light beams, allowing for precise positioning of objects within the chamber without exposing the internal space, utilizing a wavelength sweeping type light source and optical fibers to calculate distances and optical path lengths.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If the internal space of the plasma processing chamber is exposed to the atmosphere for measurement, then the measurement accessibility is improved, but the plasma processing environment is contaminated and the reliability of the chamber is deteriorated
Solution Approach 1:
A window is introduced as an intermediary component that allows light beams to pass through while maintaining the separation between the plasma processing environment and the measurement system. The window enables optical signals to traverse the chamber boundary without requiring physical access to the internal space, thus preserving chamber integrity while enabling measurement functionality.
Solution Approach 2:
The patent replaces mechanical intrusion (physical access to the chamber interior) with optical measurement methods. By using light beams that can penetrate through the window, the system achieves measurement capability without mechanical exposure of the internal space to the external atmosphere, thereby maintaining the sealed plasma environment.
2Measurement precision
If optical components are placed inside the chamber to improve measurement precision, then the measurement precision is improved, but the device complexity is increased
Solution Approach 1:
The patent extracts the light source and detector components from the chamber interior and relocates them to the external environment. Only the essential optical path through the window is maintained, removing complex internal optical components while preserving measurement capability. This extraction reduces device complexity while maintaining measurement precision through the simplified external optical system.
3Measurement precision
If multiple optical circuits are fixed to the base wafer to improve measurement accuracy, then the measurement accuracy is improved, but the manufacturing complexity is increased
Solution Approach 1:
The optical measurement system is segmented into multiple independent optical circuits that can be individually fabricated and then integrated onto the base wafer. Each optical circuit functions as a separate module, allowing for standardized manufacturing processes and simplified assembly. This segmentation enables precise positioning measurements through multiple measurement points while maintaining manufacturing feasibility through modular construction.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables accurate and stable measurement of object positions within the plasma processing chamber, allowing for precise calculation of distances and wear analysis of chamber components without exposing the internal space to the atmosphere, ensuring reliable and precise measurements.
Implementation Method 1
utilizing a wavelength sweeping type light source and optical fibers to calculate distances and optical path lengths
Implementation Method 2
The optical circuit deflects the source light beam to a target in the internal space, and deflects a reflection light beam to the window
Implementation Method 3
The external light receiving device receives the deflected reflection light beam through the window
Data Source
AI summary
A ranging apparatus for use in a plasma processing chamber having an internal space and a window is disclosed. The ranging apparatus includes at least one external light emitting device disposed external to the plasma processing chamber. The external light emitting device emits at least one source light beam to the internal space through the window. The ranging apparatus includes a base wafer disposed on a stage in the internal space. The ranging apparatus includes at least one optical circuit fixed to the base wafer. The optical circuit deflects the source light beam to a target in the internal space, and deflects a reflection light beam to the window. The ranging apparatus includes at least one external light receiving device disposed external to the plasma processing chamber. The external light receiving device receives the deflected reflection light beam through the window.