Plasma RF Waveform Feedback via EtherCAT for PEALD Control

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Solution Overview

Problem

Conventional PEALD apparatuses cannot monitor and report analog data related to plasma emission in real time, limiting the ability to link this data with trend data and provide feedback for recipe control.

Innovation Solution

The method involves using an Ether CAT protocol to acquire an RF waveform from a reactor in real time, allowing for the adjustment of electric power applied to an RF plate, thereby enabling real-time monitoring and control of plasma emission.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If a PLC logger is used to monitor analog data relating to plasma emission, then data can be captured and logged, but real-time monitoring and feedback to recipe control cannot be achieved

Engineering Contradiction:
Improvereal-time monitoring capabilityVSAvoiddata reporting delay
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The patent implements real-time feedback by having the UPC directly receive analog data from the reactor via Ether CAT network and immediately compare it with trend data to determine whether alarm output should be activated, eliminating the time delay inherent in PLC logger systems that only report data periodically to the PMC

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The patent introduces the UPC as an intermediary device between the reactor and the control system. The UPC receives analog data directly from the reactor through Ether CAT, processes it in real-time, and provides feedback to the recipe control, thereby bridging the gap between data acquisition and control decision-making

Inventive Principle:
Principle #24Intermediary (Mediator)

2Reliability

If PLC logger software is used to determine alarm necessity, then monitoring can be performed, but system complexity increases and expandability is restricted

Engineering Contradiction:
Improvemonitoring functionVSAvoidsoftware complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent extracts the alarm determination function from the complex PLC logger software and relocates it to the UPC, which has superior processing capabilities. This allows the monitoring function to be maintained while reducing software complexity and increasing expandability, as the UPC can handle multiple monitoring tasks simultaneously without requiring significant software changes

Inventive Principle:
Principle #2Taking out (Extraction)

3Ease of operation

If PLC logger is synchronized with recipe execution unit, then monitoring can be executed, but additional settings and software changes are required for expanded functions

Engineering Contradiction:
Improvemonitoring executionVSAvoidfunction expandability
Core Design Contradiction:
Ease of operationVSAdaptability or versatility

Solution Approach 1:

The patent makes the UPC a universal platform that can perform multiple functions including real-time analog data acquisition, trend data comparison, alarm determination, and recipe control feedback. The UPC's Ether CAT interface allows it to directly communicate with the reactor and receive recipe parameters, enabling expanded monitoring functions without requiring additional synchronization settings or software changes

Inventive Principle:
Principle #6Universality (Multi-functionality)

Data Source

PatentUS20250132140A1Method of manufacturing semiconductor device, and substrate treatment apparatus using ether-cat
Publication Date: 2025.04.24 ASM IP HLDG BV
  • US20250132140A1 patent drawing
  • US20250132140A1 patent drawing
  • US20250132140A1 patent drawing

AI summary

Examples of a method of manufacturing a semiconductor device includes, in treatment of a substrate with the use of a plasma, acquiring an RF waveform from a reactor through an Ether CAT in real time, the RF waveform being a waveform relating to an electric power to be applied to an RF plate, and adjusting, by using the RF waveform, the electric power to be applied to the RF plate.