Plasma Shield for Temperature Measurement Terminal
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Solution Overview
Problem
In heat treatment processes, particularly in film forming apparatuses, precise temperature measurement of a rotation table is challenging due to the risk of abnormal discharge and signal interference from plasma, which affects the accuracy of temperature control for substrates undergoing treatment.
Innovation Solution
A heat treatment apparatus with a rotation table equipped with a plasma shield part made of conductive material to cover the temperature measurement terminal, preventing abnormal discharge and signal interference from plasma, allowing for precise temperature measurement and control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a temperature measurement terminal is installed in the rotation table to measure temperature, then temperature measurement capability is improved, but abnormal discharge and signal interference from plasma occur
Solution Approach 1:
A plasma shield part made of conductive material is introduced as an intermediary between the plasma generation region and the temperature measurement terminal. This shield blocks the harmful plasma effects (abnormal discharge and signal interference) while allowing the measurement terminal to continue functioning, thus resolving the contradiction between measurement capability and plasma interference
Solution Approach 2:
The temperature measurement terminal is extracted from the direct plasma environment by positioning it in a region that does not overlap with the plasma generation region. The plasma shield part facilitates this extraction by creating a protective barrier, separating the measurement function from the harmful plasma zone
2Manufacturing precision
If the temperature measurement terminal is positioned to face the plasma generation region for real-time measurement, then temperature control accuracy is improved, but the risk of plasma interference increases
Solution Approach 1:
The plasma shield part serves as a mediator that enables the temperature measurement terminal to face the plasma generation region directionally for accurate measurement while blocking the harmful plasma effects. This resolves the contradiction by allowing the terminal to be positioned optimally for temperature control without direct plasma exposure
3Object-affected harmful factors
If a plasma shield part is added to cover the temperature measurement terminal, then protection from plasma interference is improved, but device complexity increases
Solution Approach 1:
The plasma shield part is implemented as a thin, conductive component that can be integrated into the rotation table structure. This thin-film approach provides effective plasma protection while minimizing the increase in device complexity and maintaining structural simplicity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise temperature measurement and control of the rotation table while suppressing abnormal discharge, reducing standby time and improving processing efficiency by allowing real-time temperature recognition and feedback for the heater control.
Implementation Method 1
a plasma processing part (61) that generates a plasma in a plasma generation region
Implementation Method 2
a plasma shield part (261) made of a conductor
Implementation Method 3
By heating the rotation table using thermal radiation (radiation heat) from the heater, the substrate mounted on the upper surface of the rotation table is heated
Implementation Method 4
a small-sized metallic temperature measurement part (hereinafter, referred to as a 'temperature measurement terminal'), such as a thermocouple
Data Source
AI summary
A heat treatment apparatus includes: a rotation table installed in a vacuum container, the rotation table mounting a substrate in a mounting area formed in one surface side of the rotation table and revolving the substrate; a heater that heats the rotation table; a plasma processing part that generates a plasma in a plasma generation region, which is formed in the one surface side of the rotation table at a region through which the substrate passes, and processes the substrate; a temperature measurement terminal installed in the rotation table at a region, which passes through a position facing the plasma generation region when the rotation table is rotated, the temperature measurement terminal outputting a temperature measurement result of the rotation table as an electric signal; and a conductive plasma shield part installed to cover the temperature measurement terminal when viewed from the plasma generation region.