Plasma Source Divided Electrodes Ferrite Structure
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Solution Overview
Problem
Existing plasma generation apparatuses face challenges in achieving high plasma density and uniformity, particularly for large-area target substrates, due to increased power loss and non-uniformity, and are limited by standing wave effects when using 13.56 MHz power supplies.
Innovation Solution
A plasma source device with a pair of divided electrodes and a ferrite structure that concentrates a strong magnetic field towards the target substrate, using additional pairs of divided electrodes and ferrite structures arranged in a linear or matrix configuration to enhance plasma generation uniformity and prevent electrode damage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If large parallel electrodes are used to handle large-area target substrates, then the treatment area is increased, but power loss and plasma non-uniformity are increased
Solution Approach 1:
The electrode is divided into multiple segments (first electrode segment, second electrode segment, third electrode segment) arranged in a specific pattern. This segmentation allows the magnetic field to be concentrated more effectively toward the target substrate while reducing the overall electrode size, thereby decreasing power loss while maintaining treatment area coverage.
Solution Approach 2:
A ferrite structure is introduced as an intermediary material between the electrode segments. The ferrite structure concentrates the magnetic field generated by the electrode segments toward the target substrate, enabling efficient plasma generation with reduced electrode size and power consumption.
2Area of stationary object
If large parallel electrodes are used to handle large-area target substrates, then the treatment area is increased, but plasma non-uniformity is increased
Solution Approach 1:
The electrode is divided into multiple segments (first electrode segment, second electrode segment, third electrode segment) arranged in a specific pattern. This segmentation allows the magnetic field to be concentrated more effectively toward the target substrate while reducing the overall electrode size, thereby decreasing power loss while maintaining treatment area coverage.
Solution Approach 2:
A ferrite structure is introduced as an intermediary material between the electrode segments. The ferrite structure concentrates the magnetic field generated by the electrode segments toward the target substrate, enabling efficient plasma generation with reduced electrode size and power consumption.
3Power
If 13.56 MHz power supply is used, then plasma generation is achieved, but standing wave effect limits the treatable substrate size
Solution Approach 1:
The electrode is divided into multiple segments (first electrode segment, second electrode segment, third electrode segment) arranged in a specific pattern. This segmentation allows the magnetic field to be concentrated more effectively toward the target substrate while reducing the overall electrode size, thereby decreasing power loss while maintaining treatment area coverage.
Solution Approach 2:
The electrode segments are arranged in a specific three-dimensional configuration with the ferrite structure, creating a focused magnetic field distribution that overcomes the standing wave limitation and enables treatment of larger substrates at 13.56 MHz.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution achieves high plasma density and uniformity, reduces power loss, and prevents electrode damage, improving the efficiency of semiconductor manufacturing processes by concentrating the magnetic field and minimizing standing wave effects.
Implementation Method 1
a ferrite structure comprising a portion interposed between the first divided electrode and the second divided electrode
Implementation Method 2
a ferrite structure comprising a portion interposed between the first divided electrode and the second divided electrode
Implementation Method 3
A high power RF signal is applied between the two electrodes, whereby the reaction gas is converted to a high energy plasma
Implementation Method 4
the reaction gas is converted to a high energy plasma, which is a charged aggregate of ionized atoms and molecules
Data Source
AI summary
A plasma source device includes a pair of divided electrodes including a first divided electrode and a second divided electrode spaced apart from each other and electrically coupled to each other; and a ferrite structure comprising a portion interposed the first divided electrode and the second divided electrode.