Plasma Stability Determination via Light Emission Intensity

The patent replaces complex physical measurement systems with optical detection. Instead of using complex electrical probes or mechanical sensors to measure plasma parameters, the system uses a simple light emission intensity detector (optical sensor) to monitor plasma stability. The complex calculations are performed through software algorithms (differentiation and integration of light intensity signals) rather than complex hardware systems, resolving the contradiction by substituting mechanical/electrical complexity with optical simplicity and computational processing.

The patent implements real-time feedback by continuously monitoring light emission intensity during plasma processing and immediately processing the signals through differentiation and integration calculations. The system provides instantaneous feedback on plasma stability by comparing calculated values against predetermined thresholds, enabling early abnormality detection without significant time delay. This continuous feedback loop ensures that abnormalities are detected and addressed promptly while maintaining efficient processing throughput.

The patent introduces light emission intensity as an intermediary parameter that indirectly reflects plasma stability and processing quality. Instead of directly measuring complex plasma parameters (electron density, temperature, ion flux) that would require complex instrumentation, the system uses light emission intensity—a simple optical signal—as an intermediary that correlates with plasma stability. This intermediary approach enables manufacturing precision improvement while avoiding direct complexity in the measurement system.