Plasma Processing Window Temperature Control via Segmented Fluid Plate
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
In plasma processing devices, there is a significant temperature difference between the center and edge of the window, leading to thermal stress and uneven processing distribution, which affects yield and etching interval consistency.
Innovation Solution
A plasma processing device with a plate and fluid supply unit that independently controls temperature regions, using a dielectric material with the same magnetic field permeability as the window, and incorporating a gas feed with the same material, to ensure uniform magnetic field intensity and temperature control through selective fluid supply of hot or cool air.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a window covers the etching chamber where plasma processing is performed, then the chamber can be sealed and plasma can be contained, but a temperature difference occurs between the center and edge of the window causing thermal stress and processing distribution issues
Solution Approach 1:
The plate is divided into a first region and a second region, each independently supplied with fluid through separate inlet and outlet ports. This segmentation allows different temperature control strategies to be applied to different areas of the window, specifically addressing the temperature difference between center and edge regions
Solution Approach 2:
The fluid supply unit independently controls the first and second regions by adjusting flow rates and temperatures for each region separately. This local quality control enables precise temperature management at different locations on the window surface, reducing thermal stress and processing distribution issues
2Stability of the object's composition
If the plate and gas feed include the same material with matching dielectric constant and magnetic field permeability, then uniform magnetic field intensity can be achieved across the window, but the device complexity increases
Solution Approach 1:
The plate and gas feed are made from the same material (e.g., PEEK) with identical dielectric constant and magnetic field permeability. This homogeneity ensures uniform magnetic field intensity across the entire window area, as the magnetic field generated by the antenna passes through both components without distortion or variation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces temperature differences between the center and edge of the window, maintaining uniform temperature and reducing thermal stress and processing distribution issues, thereby improving yield and etching interval consistency.
Implementation Method 1
a fluid supply unit supplying a fluid for controlling temperatures of the window and the antenna
Implementation Method 2
an antenna generating a magnetic field
Implementation Method 3
allows a magnetic field generated by an antenna to be incident into the entire area of a window with the same intensity
Implementation Method 4
The fluid includes a first fluid for lowering temperatures of the window and the antenna and a second fluid for raising the temperature of the window
Data Source
AI summary
A plasma processing device is provided. The plasma processing device includes a plate formed between a window covering a top portion of a chamber where plasma processing is performed and an antenna generating a magnetic field, and a fluid supply unit supplying a fluid for controlling temperatures of the window and the antenna, wherein the plate includes first and second regions supplied with the fluid, and the fluid supply unit independently controls the first and second regions.