Polishing Composition Multi-Size Abrasive Grains

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Solution Overview

Problem

Current polishing compositions are inefficient in rapidly removing scratches from metal and other surfaces without compromising surface quality, particularly in the context of shortened product life cycles and increased competition, which necessitates a higher polishing rate.

Innovation Solution

A polishing composition comprising abrasive grains with a Mohs hardness of 8 or more and a dispersing medium, where the abrasive grains have two or more local maximum points at different particle sizes in a volume-based particle size distribution, allowing for enhanced scratch removal and polishing rate without deteriorating surface quality.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If conventional polishing compositions with single particle size distribution are used, then the polishing process is simple to control, but the polishing rate is low and scratches are removed slowly

Engineering Contradiction:
Improvepolishing rateVSAvoidparticle size distribution complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The polishing composition divides abrasive grains into multiple particle size segments, each serving a specific function: larger grains (0.5-2.0 μm) for rapid scratch removal, medium grains (0.2-0.5 μm) for intermediate polishing, and smaller grains (0.05-0.2 μm) for surface finishing. This segmentation enables simultaneous achievement of high polishing rate and surface quality without requiring multiple separate polishing steps.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Different regions of the particle size distribution are assigned different functional qualities: coarse particles provide aggressive scratch removal capability, while fine particles provide smooth surface finishing capability. The composition leverages the local quality of each particle size range to optimize both productivity and surface quality in a single polishing operation.

Inventive Principle:
Principle #3Local quality

2Productivity

If larger abrasive grains are used to increase polishing rate, then scratch removal speed increases, but surface quality deteriorates due to deeper scratches and rougher finish

Engineering Contradiction:
Improvescratch removal speedVSAvoidsurface quality
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The polishing composition implements a nested structure where smaller abrasive grains are embedded within and around larger grains. During polishing, larger grains perform the primary scratch removal function, while smaller grains simultaneously work on the same surface areas to smooth and refine the surface. This nested arrangement allows both functions to occur concurrently without requiring separate polishing steps.

Inventive Principle:
Principle #7Nested doll (Nesting)

Solution Approach 2:

The invention creates a composite abrasive system combining multiple particle size ranges in a single composition. This composite approach integrates the high material removal capability of coarse grains with the surface finishing capability of fine grains, achieving both high productivity and high manufacturing precision in one polishing operation.

Inventive Principle:
Principle #40Composite materials

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The composition effectively accelerates the polishing process by ensuring a high polishing rate and maintaining surface quality, as the broad particle size distribution of abrasive grains leads to a more densely packed state, applying stronger mechanical force and efficiently removing scratches.

Implementation Method 1

polishing is performed using hard abrasive grains having a high Mohs hardness, such as those from diamond... scratches on a metal surface are removed to obtain a smooth surface

Methodology Applied
Scientific EffectAbrasion: Abrasion

Implementation Method 2

two or more local maximum points at different particle sizes in a volume-based particle size distribution measured by a porous electrical resistance method

Methodology Applied
Scientific EffectElectrical resistance measurement: Electrical Resistance

Data Source

PatentUS20240254364A1Polishing composition, polishing method using the polishing composition, and method for producing metallic mold using the polishing composition
Publication Date: 2024.08.01 FUJIMI INCORPORATED
  • US20240254364A1 patent drawing

AI summary

The present invention provides a polishing composition which is capable of rapidly removing scratches and exhibits a high polishing rate without deteriorating surface quality. One aspect of the present invention relates to the polishing composition contains abrasive grains having a Mohs hardness of 8 or more, and a dispersing medium, wherein the abrasive grains have two or more local maximum points at different particle sizes in a volume-based particle size distribution measured by a porous electrical resistance method.