Polishing Liquid Filter Bubble Exhaust Automation

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Solution Overview

Problem

The existing methods for removing bubbles from polishing liquid filters in semiconductor manufacturing are cumbersome and pose safety risks due to the manual handling of chemical agents.

Innovation Solution

A polishing liquid supply system that includes a sensor to detect bubbles, a controller to monitor the polishing machine's state, and an exhaust unit with a control valve to automatically discharge bubbles when the machine is idle.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If manual bubble discharge is performed, then bubbles are removed from the polishing liquid filter, but personnel safety is compromised due to chemical splash risk

Engineering Contradiction:
Improvebubble removal effectivenessVSAvoidchemical splash risk
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The system enables automatic bubble discharge through an exhaust unit that operates autonomously based on sensor detection, eliminating the need for manual intervention and thereby removing personnel exposure to chemical splash risks while maintaining effective bubble removal

Inventive Principle:
Principle #25Self-service

2Reliability

If manual bubble discharge is performed, then bubbles are removed from the polishing liquid filter, but machine utilization rate decreases due to operational downtime

Engineering Contradiction:
Improvebubble removal effectivenessVSAvoidmachine utilization rate
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The automatic exhaust system operates independently during polishing operations, detecting and discharging bubbles without requiring machine shutdown or operator intervention, thereby maintaining continuous production and maximizing machine utilization while ensuring reliable bubble removal

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

The system maintains continuous polishing operation by performing bubble discharge automatically during idle moments within the polishing cycle, ensuring that the useful action of polishing continues uninterrupted while bubbles are removed as needed

Inventive Principle:
Principle #20Continuity of useful action

3Reliability

If manual bubble discharge is performed, then bubbles are removed from the polishing liquid filter, but operational complexity increases due to cumbersome procedures

Engineering Contradiction:
Improvebubble removal effectivenessVSAvoidoperational simplicity
Core Design Contradiction:
ReliabilityVSEase of operation

Solution Approach 1:

The system performs bubble removal automatically through sensor detection and automated exhaust unit activation, completely eliminating the need for manual operation and thereby maximizing operational simplicity while maintaining effective bubble removal

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

The manual mechanical operation of opening valves and discharging bubbles is replaced by an automated control system that uses sensors to detect bubbles and electronically actuates the exhaust mechanism, thereby simplifying operation while achieving reliable bubble removal

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The system simplifies the bubble removal process, reduces the risk of chemical splashes, and enhances machine utilization by automating the bubble discharge during idle states.

Implementation Method 1

a sensor for detecting whether there are bubbles in the polishing liquid filter

Methodology Applied
Scientific EffectBubble detection:

Implementation Method 2

The control valve is configured to be opened after receiving the exhaust signal to exhaust the bubbles

Methodology Applied
Scientific EffectGas discharge:

Data Source

PatentUS12311500B2Polishing liquid supply system, polishing apparatus, exhausting method and polishing method
Publication Date: 2025.05.27 CHANGXIN MEMORY TECH INC
  • US12311500B2 patent drawing
  • US12311500B2 patent drawing
  • US12311500B2 patent drawing

AI summary

A polishing liquid supply system, polishing apparatus, exhausting method and polishing method are provided. The system includes a polishing liquid filter; a sensor for detecting whether there are bubbles in the polishing liquid filter; a controller which is connected to the polishing machine and the sensor, and configured to send an exhaust signal when the polishing machine is in an idle state and the sensor detects that there are bubbles in the polishing liquid filter; and an exhaust unit which includes an exhaust pipeline and a control valve, wherein the exhaust pipeline is in communication with the inside of the polishing liquid filter, and the control valve is arranged on the exhaust pipeline and is connected to the controller for opening after receiving the exhaust signal so as to exhaust the bubbles.