Polishing Pad Moving Track Pre-Conditioning

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Solution Overview

Problem

The existing polishing pads require a lengthy pre-conditioning process, which occupies valuable time and reduces production efficiency, as they need to undergo surface treatment and dummy polishing to achieve a stable state, typically taking 20 to 60 minutes.

Innovation Solution

A polishing pad with a special moving track or deformation orientation is fabricated by forming a nonparallelly distributed track or orientation on its surface, coinciding with the polishing track of the article, using a rotatable plane cutting tool or dummy article to simulate the polishing path and create a shear force, thereby shortening the pre-conditioning time.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a new polishing pad undergoes conventional pre-conditioning procedures (surface treatment and dummy polishing), then the polishing pad surface achieves a stable state, but the pre-conditioning time takes 20 to 60 minutes

Engineering Contradiction:
Improvepolishing pad surface stabilityVSAvoidpre-conditioning time
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

The patent applies preliminary action by pre-forming moving tracks and deformation orientations on the polishing pad surface during the fabricating process, before the pad is installed and used. This preliminary structuring of the surface eliminates the need for lengthy pre-conditioning procedures, as the surface is already in its optimal working state when first installed

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent replaces the conventional mechanical pre-conditioning process (surface treatment and dummy polishing taking 20-60 minutes) with a fabricating-time intervention where moving tracks and deformation orientations are formed during pad manufacturing. This substitution eliminates the time-consuming operational pre-conditioning step

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Reliability

If the polishing machine performs pre-conditioning procedures for 20 to 60 minutes, then the polishing pad becomes ready for use, but the polishing machine cannot be used for real product polishing during this time

Engineering Contradiction:
Improvepolishing pad readinessVSAvoidproduction efficiency
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The patent moves the surface preparation action from the operational phase (pre-conditioning before use) to the manufacturing phase (forming tracks during fabricating). This timing shift ensures the pad is ready for immediate use upon installation, eliminating machine idle time and improving production efficiency

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The polishing pad is designed to be self-sufficient from installation, with its surface structure (moving tracks and deformation orientations) already optimized for immediate use. The pad serves itself by having its surface requirements met during manufacturing, eliminating the need for the machine to perform time-consuming pre-conditioning operations

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach significantly reduces the pre-conditioning time by up to 50%, enhancing production efficiency and allowing the polishing machine to be used for real product polishing sooner.

Implementation Method 1

Through the friction generated by the relative movement, a part of the surface of the article is removed

Methodology Applied
Scientific EffectFriction: Friction

Implementation Method 2

forming a moving track on a surface of the semi-finished polishing pad... forming a deformation orientation on the surface of the semi-finished polishing pad

Methodology Applied
Scientific EffectShear force: Shear Stress

Data Source

PatentUS8517800B2Polishing pad and fabricating method thereof
Publication Date: 2013.08.27 IV TECH CO LTD
  • US8517800B2 patent drawing
  • US8517800B2 patent drawing
  • US8517800B2 patent drawing

AI summary

A method of fabricating a polishing pad for polishing an article is described. The method includes providing a semi-finished polishing pad and then forming a moving track on the surface of the semi-finished polishing pad. The moving track substantially coincides with a polishing track of the article on the polishing pad.