Polishing and Rinse Composition Production for Coarse-Particle Control
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Solution Overview
Problem
Conventional methods for producing polishing and rinse compositions are insufficient in reducing coarse particles, leading to defects in semiconductor substrates that can affect electrical characteristics.
Innovation Solution
A method involving the preparation and filtration of abrasive grain and chemical component-containing aqueous solutions, followed by mixing and filtering to produce a polishing composition, and a method involving the preparation and filtration of water-soluble polymer-containing liquids and chemical component-containing aqueous solutions, followed by mixing and filtering to produce a rinse composition.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional filtration methods are used to prepare polishing composition, then the production process is simple, but coarse particles are not sufficiently removed leading to defects in semiconductor substrates
Solution Approach 1:
The filtration process is divided into multiple sequential stages: first filtration of abrasive grain dispersion, then filtration of chemical component-containing aqueous solution, mixing to form mixture X, and final filtration of the mixture. This segmentation allows each filtration stage to target specific particle sizes and types, achieving superior removal of coarse particles while maintaining process manageability.
Solution Approach 2:
The abrasive grain dispersion and chemical component-containing aqueous solution are filtered separately before mixing. This preliminary action removes coarse particles from each component individually, preventing their formation during mixing and ensuring high purity of the final polishing composition.
2Manufacturing precision
If conventional filtration methods are used to prepare rinse composition, then the production process is simple, but coarse particles are not sufficiently removed leading to defects in semiconductor substrates
Solution Approach 1:
The rinse composition production employs segmented filtration: first filtration of water-soluble polymer-containing liquid, then filtration of chemical component-containing aqueous solution, mixing to form mixture Z, and final filtration of the mixture. This multi-stage approach ensures coarse particles are removed from each component and the final product, achieving high manufacturing precision.
Solution Approach 2:
Both the water-soluble polymer-containing liquid and chemical component-containing aqueous solution undergo preliminary filtration before mixing. This prevents coarse particles from being introduced into the rinse composition during mixing and ensures the final product is free from defects-causing particles.
3Reliability
If multiple filtration steps are implemented to reduce coarse particles, then defect generation is suppressed, but production time and process complexity increase
Solution Approach 1:
The filtration operations are performed continuously on separate streams (abrasive grain dispersion and chemical component-containing aqueous solution) before mixing, rather than filtering the final mixture alone. This continuous filtration of components prevents coarse particle formation during mixing and reduces total filtration time compared to single-stage filtration of the final product.
Solution Approach 2:
By performing filtration on individual components before mixing, the process prevents the need for extensive final filtration of the complete mixture. This preliminary removal of coarse particles from each component significantly reduces the time required for the final filtration step while maintaining high reliability in defect suppression.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Reduces coarse particles and suppresses defects in semiconductor substrates, enhancing the quality of polishing and rinse compositions.
Implementation Method 1
filtering the abrasive grain dispersion; preparing a second liquid by providing at least one chemical component-containing aqueous solution and filtering the aqueous solution; mixing the first liquid and the second liquid to prepare a third liquid, and filtering the third liquid
Data Source
AI summary
The purpose of the present invention is to provide a novel method for producing a polishing composition and a novel method for producing a rinse composition, which enables reducing coarse particles and enables suppressing generation of defects. The method for producing a polishing composition includes preparing a first liquid by providing an abrasive grain dispersion containing abrasive grains and water, and filtering the abrasive grain dispersion; preparing a second liquid by providing at least one chemical component-containing aqueous solution containing a chemical component and water, and filtering the aqueous solution when one chemical component-containing aqueous solution is provided, or filtering a mixture X containing at least one chemical component-containing aqueous solution; and mixing the first liquid and the second liquid to prepare a third liquid, and filtering the third liquid.