Polishing Tape Edge Alignment for Right-Angled Substrate Profiles
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Solution Overview
Problem
Conventional polishing apparatuses for semiconductor substrates often result in oblique edge surfaces during the polishing of peripheral portions, leading to acute edges that can break and cause defects, lowering the yield in fabrication processes.
Innovation Solution
A polishing apparatus and method that includes a substrate holder for rotating the substrate and a polishing unit with a pressing member to press a polishing tape against the substrate from above, ensuring the polishing tape is parallel to the substrate surface, and using a tape-edge detection sensor to align the tape edge with the pressing member, allowing for a right-angled cross-sectional shape to be formed.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If an inclined polishing tape is used to polish the top edge portion of the substrate, then the polishing process can be performed, but an oblique edge surface is formed on the device layer, leading to acute edges that are easily broken
Solution Approach 1:
Instead of inclining the polishing tape to access the top edge portion, the invention inverts the approach by using a vertically oriented polishing tape that contacts the top edge portion from above. The polishing tape is pressed downward by a pressing member, reversing the conventional inclination method and achieving a right-angled edge surface instead of an oblique one.
Solution Approach 2:
The invention changes the dimensional approach by moving the polishing action from a lateral inclination to a vertical dimension. The polishing tape extends in the radial direction of the substrate and contacts the top edge portion vertically, adding a vertical component to the polishing process that eliminates the oblique surface formation.
2Manufacturing precision
If a right-angled member is used to press the polishing tape against the substrate, then the polishing can be performed, but the polishing tape is rounded at the corner due to its thickness and hardness, still forming an oblique edge surface
Solution Approach 1:
The invention extracts the pressing function from a complex right-angled mechanical member and implements it through a simpler pressing member that applies vertical force. The pressing member is configured to press the polishing tape downward without requiring complex right-angled structures, simplifying the apparatus while achieving the desired right-angled edge surface.
Solution Approach 2:
The invention changes the orientation parameter of the polishing tape from inclined to vertical. By adjusting the tape extension direction to be parallel to the radial direction of the substrate and pressing it vertically downward, the corner rounding issue is eliminated while maintaining manufacturing precision.
3Reliability
If the polishing tape is pressed against the peripheral portion of the substrate, then the unwanted films can be removed, but the tape must be precisely positioned to avoid forming oblique surfaces
Solution Approach 1:
The polishing apparatus is designed to polish multiple regions of the substrate periphery using the same vertical polishing mechanism. The pressing member can be positioned to polish the top edge portion, bottom edge portion, and bevel portion, providing universal functionality that reduces positioning complexity while maintaining high yield through consistent right-angled surface formation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively polishes the substrate's peripheral portion to achieve a right-angled cross-sectional shape, reducing the risk of edge breakage and defects, thereby improving yield in semiconductor device fabrication.
Implementation Method 1
polishing the peripheral portion of the substrate W by bringing a polishing surface of a polishing tape 38 into contact with the peripheral portion of the substrate W
Data Source
AI summary
The polishing apparatus has a polishing unit capable of forming a right-angled cross section by polishing a peripheral portion of the substrate. The polishing unit includes a polishing head having a pressing member configured to press a polishing tape against the peripheral portion of the substrate from above, a tape supply and recovery mechanism configured to supply the polishing tape to the polishing head and to recover the polishing tape from the polishing head, a first moving mechanism configured to move the polishing head in a radial direction of the substrate, and a second moving mechanism configured to move the tape supply and recovery mechanism in the radial direction of the substrate. The guide rollers are arranged such that the polishing tape extends parallel to a tangential direction of the substrate and a polishing surface of the polishing tape is parallel to a surface of the substrate.


