Polyaniline Pattern Formation via Photocurable PSS Template

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Solution Overview

Problem

Current methods for forming electrically-conductive polyaniline patterns are complex and costly, requiring conductive substrates, multiple processing steps, and post-treatment with acidic solutions, making them unsuitable for roll-to-roll manufacturing and flexible applications.

Innovation Solution

A method involving a photocurable composition with water-soluble reactive polymers, crosslinked via [2+2] photocycloaddition, is used to create a durable template for polyaniline formation, allowing for the growth of electrically-conductive polyaniline within or on the crosslinked polymer without additional processing, using aniline monomer and oxidizing agents.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If traditional chemical oxidative polymerization is used to form polyaniline, then the polymer can be formed, but the resulting powder is insoluble in water and requires strong acids for doping that will volatilize from thin coatings

Engineering Contradiction:
Improvesolubility and stability of polyaniline coatingVSAvoidvolatilization of strong acid dopants
Core Design Contradiction:
ReliabilityVSObject-generated harmful factors

Solution Approach 1:

The patent uses poly(styrene sulfonic acid) (PSS) as an intermediary substance to provide the necessary acidic dopant environment for polyaniline formation without requiring volatile strong acids. The PSS acts as a mediator that supplies protons for doping while remaining non-volatile and water-soluble, enabling stable coating formation.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The patent changes the chemical parameters of the dopant system by replacing volatile strong acids (HCl, p-toluene sulfonic acid) with a non-volatile acidic polymer (PSS). This parameter change maintains the necessary acidity for polyaniline doping while eliminating the volatilization problem, enabling stable thin coating formation.

Inventive Principle:
Principle #35Parameter changes

2Manufacturing precision

If lithographic methods are used to pattern polyaniline films, then patterns can be formed, but the process is complex and requires multiple processing steps including masking and development

Engineering Contradiction:
Improvepattern resolutionVSAvoidnumber of processing steps
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent incorporates photomasking capability directly into the polyaniline coating formulation itself, rather than requiring separate masking layers and development steps. The coating contains photodecomposable compounds that allow direct light-based patterning during or after coating application, eliminating the need for separate masking and development processes.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent merges the functions of the polyaniline coating and the photomasking layer into a single integrated coating system. The coating simultaneously provides electrical conductivity and photopatterning capability through the inclusion of photodecomposable compounds, combining multiple functions that were previously performed by separate components.

Inventive Principle:
Principle #5Merging (Combining)

3Manufacturing precision

If vacuum deposition and etching methods are used to form patterns, then high precision patterns can be achieved, but the process is expensive and does not lend itself to roll-to-roll coating operations

Engineering Contradiction:
Improvepattern precisionVSAvoidcompatibility with roll-to-roll manufacturing
Core Design Contradiction:
Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The patent replaces complex mechanical vacuum deposition and etching systems with a simpler chemical solution-based approach. By incorporating photodecomposable compounds into the coating, patterning is achieved through light exposure and chemical decomposition rather than vacuum-based physical deposition and etching, enabling roll-to-roll manufacturing compatibility.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the processing parameters from high-vacuum, high-energy deposition and etching conditions to ambient-condition photopatterning. The use of photodecomposable compounds allows patterning to occur under simple light exposure, dramatically simplifying the manufacturing process and enabling continuous roll-to-roll production while maintaining pattern precision.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method enables the formation of high-resolution, water-insoluble, and durable electrically-conductive polyaniline patterns on flexible substrates, simplifying the process and reducing costs, suitable for roll-to-roll manufacturing and flexible applications.

Implementation Method 1

exposing the pattern of the photocurable composition to radiation sufficient to cause crosslinking via [2+2] photocycloaddition of the (b) recurring units

Methodology Applied
Scientific Effect[2+2] photocycloaddition: Photopolymerisation

Implementation Method 2

contacting the crosslinked polymer with an aniline reactive composition comprising an aniline monomer and up to 0.5 molar of an aniline oxidizing agent, in a molar ratio of from 1:0.5 to 1:1.5 of the aniline monomer to the aniline oxidizing agent, thereby forming a pattern of electrically-conductive polyaniline

Methodology Applied
Scientific Effectoxidative polymerization: Oxidation

Data Source

PatentUS9718935B1Method of preparing article with polyaniline pattern
Publication Date: 2017.08.01 EASTMAN KODAK CO
  • US9718935B1 patent drawing
  • US9718935B1 patent drawing
  • US9718935B1 patent drawing

AI summary

A method is used to provide an electrically-conductive polyaniline patterns on a substrate. A photocurable composition is applied as a pattern, comprising a water-soluble reactive polymer comprising (a) greater than 40 mol % of recurring units comprising sulfonic acid or sulfonate groups, (b) at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition. The pattern is exposed to radiation sufficient to cause crosslinking via [2+2] photocycloaddition of the (b) recurring units to form a pattern of crosslinked polymer. The crosslinked polymer is contacted with an aniline reactive composition comprising an aniline monomer and up to 0.5 molar of an aniline oxidizing agent, in a molar ratio of from 1:0.5 to 1:1.5 of the aniline monomer to the aniline oxidizing agent. A pattern of electrically-conductive polyaniline disposed within, on top of, or both within and on top of, the crosslinked polymer only.