Polyhydroxyamide Cured Film for Low Stress Copper Adhesion

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Conventional cyclized polyimides and polybenzoxazoles with flexible groups face issues of reduced mechanical properties, increased stress on substrates, and poor adhesion to metals like copper, particularly in semiconductor devices.

Innovation Solution

A photosensitive resin composition comprising a polyhydroxyamide with a ring-closure rate of not more than 10% is used to form a cured film, which is applied to substrates, exposed to light, and then heat-treated to achieve high elongation, low stress, and strong adhesion to metals.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Stress or pressure

If cyclized polyimides or polybenzoxazoles containing flexible groups are used, then stress is reduced, but mechanical properties deteriorate

Engineering Contradiction:
ImprovestressVSAvoidmechanical properties
Core Design Contradiction:
Stress or pressureVSStrength

Solution Approach 1:

The patent changes the chemical structure parameters by using polyhydroxyamide with controlled ring-closure rate (not more than 10%) instead of conventional cyclized polyimides or polybenzoxazoles. This parameter change allows achieving low stress without sacrificing mechanical properties, as the polyhydroxyamide maintains appropriate molecular flexibility while preserving structural integrity.

Inventive Principle:
Principle #35Parameter changes

2Stability of the object's composition

If dehydrating cyclization is promoted during curing of polybenzoxazoles, then ring-closure is enhanced, but stress on substrate increases and adhesion to metals deteriorates

Engineering Contradiction:
Improvering-closureVSAvoidstress on substrate
Core Design Contradiction:
Stability of the object's compositionVSStress or pressure

Solution Approach 1:

The patent converts the potentially harmful dehydrating cyclization reaction into a beneficial process by controlling it to occur to a limited extent (ring-closure rate not more than 10%). This controlled partial cyclization provides beneficial adhesion to metal substrates while avoiding the harmful effect of excessive stress generation that would occur with complete cyclization.

Inventive Principle:
Principle #22Blessing in disguise (Convert harm into benefit)

3Stability of the object's composition

If dehydrating cyclization is promoted during curing of polybenzoxazoles, then ring-closure is enhanced, but adhesion to metals deteriorates

Engineering Contradiction:
Improvering-closureVSAvoidadhesion to metals
Core Design Contradiction:
Stability of the object's compositionVSReliability

Solution Approach 1:

The patent optimizes the ring-closure parameter by limiting it to not more than 10%, which creates the ideal balance for metal adhesion. This parameter control ensures that enough cyclization occurs to provide chemical stability and crosslinking, while sufficient hydroxyl groups remain to form strong bonds with metal substrates through coordination or chemisorption.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The resulting cured film exhibits high elongation, low stress, and excellent adhesion to metals, enhancing the reliability and mechanical properties of semiconductor devices.

Implementation Method 1

the solubility in the alkaline solution is significantly increased in an exposed portion through the light-induced acid generation by the quinonediazide compound

Methodology Applied
Scientific EffectPhotoacid generation: Photopolymerisation

Implementation Method 2

dehydrating cyclization during the curing of the polybenzoxazoles

Methodology Applied
Scientific EffectDehydrating cyclization: Condensation

Data Source

PatentUS10545406B2Cured film formed by curing photosensitive resin composition and method for manufacturing same
Publication Date: 2020.01.28 TORAY INDUSTRIES INC
  • US10545406B2 patent drawing
  • US10545406B2 patent drawing
  • US10545406B2 patent drawing

AI summary

Provided is a cured film of high elongation, low stress, and high adhesion to metal copper. The cured film is formed by curing a photosensitive resin composition, wherein the photosensitive resin comprises a polyhydroxyamide, and wherein the rate of ring-closure of the polyhydroxyamide in the cured film is not more than 10%.